Radiation hardness studies of AMS HV-CMOS 350nm prototype chip HVStripV1
文献类型:期刊论文
作者 | Kanisauskas, K; Affolder, A; Arndt, K; Bates, R; Benoit, M; Di Bello, F; Blue, A; Bortoletto, D; Buckland, M; Buttar, C |
刊名 | JOURNAL OF INSTRUMENTATION
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出版日期 | 2017 |
卷号 | 12页码:2010 |
关键词 | Radiation-hard detectors Solid state detectors Si microstrip and pad detectors |
ISSN号 | 1748-0221 |
DOI | 10.1088/1748-0221/12/02/P02010 |
文献子类 | Article |
英文摘要 | CMOS active pixel sensors are being investigated for their potential use in the ATLAS inner tracker upgrade at the HL-LHC. The new inner tracker will have to handle a significant increase in luminosity while maintaining a sufficient signal-to-noise ratio and pulse shaping times. This paper focuses on the prototype chip "HVStripV1" (manufactured in the AMS HV-CMOS 350nm process) characterization before and after irradiation up to fluence levels expected for the strip region in the HL-LHC environment. The results indicate an increase of depletion region after irradiation for the same bias voltage by a factor of approximate to 2.4 and approximate to 2.8 for two active pixels on the test chip. There was also a notable increase in noise levels from 85e(-) to 386e(-) and from 75e(-) to 277e(-) for the corresponding pixels. |
WOS关键词 | HIGH-ENERGY-PHYSICS ; PIXEL DETECTOR |
WOS研究方向 | Instruments & Instrumentation |
语种 | 英语 |
WOS记录号 | WOS:000397826200010 |
源URL | [http://ir.ihep.ac.cn/handle/311005/284482] ![]() |
专题 | 高能物理研究所_加速器中心 高能物理研究所_实验物理中心 |
作者单位 | 中国科学院高能物理研究所 |
推荐引用方式 GB/T 7714 | Kanisauskas, K,Affolder, A,Arndt, K,et al. Radiation hardness studies of AMS HV-CMOS 350nm prototype chip HVStripV1[J]. JOURNAL OF INSTRUMENTATION,2017,12:2010. |
APA | Kanisauskas, K.,Affolder, A.,Arndt, K.,Bates, R.,Benoit, M.,...&宋维民.(2017).Radiation hardness studies of AMS HV-CMOS 350nm prototype chip HVStripV1.JOURNAL OF INSTRUMENTATION,12,2010. |
MLA | Kanisauskas, K,et al."Radiation hardness studies of AMS HV-CMOS 350nm prototype chip HVStripV1".JOURNAL OF INSTRUMENTATION 12(2017):2010. |
入库方式: OAI收割
来源:高能物理研究所
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