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Effect of background pressure on Co/C multilayers
文献类型：期刊论文
| 作者 | Wang, ZS; Wen, MW; Cui, MQ ; Wang, DL; Zhang, Z; Li, P; Jiang, L; Wang DL(王得来); Ma, S; Cui MQ(崔明启)
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| 刊名 | APPLIED OPTICS
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| 出版日期 | 2017 |
| 卷号 | 56期号:4页码:C16-C20 |
| ISSN号 | 1559-128X |
| DOI | 10.1364/AO.56.000C16 |
| 文献子类 | Article |
| 英文摘要 | Co/C multilayers with a period thickness of 3.54 nm and 30 bilayers were deposited by direct current magnetron sputtering with different background pressures. The effects of residual background gases were investigated. The films were characterized by using grazing incidence hard x-ray reflectivity, soft x-ray reflectivity, and x-ray photoelectron spectroscopy. The results indicate that the x-ray reflectivity of Co/C multilayers decreases with increasing background pressure as well as the increasing interlayer roughness. The inclusion of more residual background air increases the interdiffusion of Co and C layers. (C) 2016 Optical Society of America |
| 电子版国际标准刊号 | 2155-3165 |
| WOS关键词 | FILMS ; RADIATION ; EVOLUTION ; MODEL |
| WOS研究方向 | Optics |
| 语种 | 英语 |
| CSCD记录号 | CSCD:6120971 |
| WOS记录号 | WOS:000394309200003 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/284721]  |
| 专题 | 高能物理研究所_实验物理中心 高能物理研究所_多学科研究中心 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Wang, ZS,Wen, MW,Cui, MQ,et al. Effect of background pressure on Co/C multilayers[J]. APPLIED OPTICS,2017,56(4):C16-C20. |
| APA | Wang, ZS.,Wen, MW.,Cui, MQ.,Wang, DL.,Zhang, Z.,...&Huang, QS.(2017).Effect of background pressure on Co/C multilayers.APPLIED OPTICS,56(4),C16-C20. |
| MLA | Wang, ZS,et al."Effect of background pressure on Co/C multilayers".APPLIED OPTICS 56.4(2017):C16-C20. |
入库方式： OAI收割
来源：高能物理研究所
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