In situ study on the thermal stability and interfaces properties of Er2O3/Al2O3/Si multi stacked films by X-ray photoelectron spectroscopy
文献类型：期刊论文
| 作者 | Ablat, A; Ibrahim, K; Wang, JO ; Liu, C; Zhao, JL; Zhao JL(赵佳丽); Liu C(刘晨); Wang JO(王嘉鸥); Mamat, M; Kui RX(奎热西)
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| 刊名 | SUPERLATTICES AND MICROSTRUCTURES
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| 出版日期 | 2017 |
| 卷号 | 104页码:415-421 |
| 关键词 | High-k dielectric PLD Er2O3 XPS |
| ISSN号 | 0749-6036 |
| DOI | 10.1016/j.spmi.2017.02.050 |
| 文献子类 | Article |
| 英文摘要 | Ultrathin high-k dielectric films with Er2O3/Al2O3/Si structure were fabricated by the pulsed laser deposition (PLD) technique. The samples were annealed in O-2 ambient at the various temperatures. The interface reaction, and as well as the thermal stability between Si substrate and Er2O3 layer were studied in situ using X-ray photoelectron spectroscopy (XPS). The Film thickness was measured with scanning electron microscope (SEM). The experimental results indicate that the thickness of the silicate layer lessening at the interface with increasing of the thickness of Al2O3, and the production of the SiOx and the silicide is more easily formed than Er-silicate after annealing at the lower temperature because of the similarity of the structure and the small lattice mismatch. (C) 2017 Elsevier Ltd. All rights reserved. |
| WOS关键词 | GATE DIELECTRICS ; THIN-FILMS ; SI(100) |
| WOS研究方向 | Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000400536000047 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/284932]  |
| 专题 | 高能物理研究所_多学科研究中心 高能物理研究所_粒子天体物理中心 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Ablat, A,Ibrahim, K,Wang, JO,et al. In situ study on the thermal stability and interfaces properties of Er2O3/Al2O3/Si multi stacked films by X-ray photoelectron spectroscopy[J]. SUPERLATTICES AND MICROSTRUCTURES,2017,104:415-421. |
| APA | Ablat, A.,Ibrahim, K.,Wang, JO.,Liu, C.,Zhao, JL.,...&Ghupur, Y.(2017).In situ study on the thermal stability and interfaces properties of Er2O3/Al2O3/Si multi stacked films by X-ray photoelectron spectroscopy.SUPERLATTICES AND MICROSTRUCTURES,104,415-421. |
| MLA | Ablat, A,et al."In situ study on the thermal stability and interfaces properties of Er2O3/Al2O3/Si multi stacked films by X-ray photoelectron spectroscopy".SUPERLATTICES AND MICROSTRUCTURES 104(2017):415-421. |
入库方式： OAI收割
来源：高能物理研究所
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