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Fabrication of high energy X-ray compound kinoform lenses using X-ray lithography

文献类型：期刊论文

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作者Liu J(刘静); Zhang WW(张伟伟); Chang GC(常广才); Yi FT(伊福廷); Liu, J; Zhang, WW; Chang, GC; Yi, FT
刊名MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS ; MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS
出版日期2017 ; 2017
卷号23期号:5页码:1553-1562
ISSN号0946-7076 ; 0946-7076
DOI10.1007/s00542-017-3304-1 ; 10.1007/s00542-017-3304-1
文献子类Article; Proceedings Paper ; Article; Proceedings Paper
英文摘要Nickel high energy X-ray compound kinoform lenses were fabricated by X-ray lithography technology at Beijing Synchrotron Radiation Facility. The nickel compound refractive lenses aim at focusing X-ray with 50 keV and the designed smallest width of the tooth-like segment is 2.5 mu m. To keep the best morphology of the element, Au masks were made twice, whose thickness gradually increased. The fabrication process of compound lenses consists of three parts in general, including the intermediate mask (1.2 mu m thick Au pattern) fabrication, the working mask (12 mu m thick Au pattern) fabrication and the 300 mu m high lenses fabrication. The intermediate mask was made by UV lithography (UV sample) and electron beam direct write lithography (EBDW sample) for comparison, and the EBDW sample had a better morphology than the UV sample at each step. Both samples were tested using the knife-edge scan method at BL13W1 beamline in Shanghai Synchrotron Radiation Facility, which provided the focal widths of 9.2 and 10.4 mu m, and the photon flux gains of 6.9 and 5.4 for the EBDW and UV samples at an X-ray energy with 50 keV, respectively.; Nickel high energy X-ray compound kinoform lenses were fabricated by X-ray lithography technology at Beijing Synchrotron Radiation Facility. The nickel compound refractive lenses aim at focusing X-ray with 50 keV and the designed smallest width of the tooth-like segment is 2.5 mu m. To keep the best morphology of the element, Au masks were made twice, whose thickness gradually increased. The fabrication process of compound lenses consists of three parts in general, including the intermediate mask (1.2 mu m thick Au pattern) fabrication, the working mask (12 mu m thick Au pattern) fabrication and the 300 mu m high lenses fabrication. The intermediate mask was made by UV lithography (UV sample) and electron beam direct write lithography (EBDW sample) for comparison, and the EBDW sample had a better morphology than the UV sample at each step. Both samples were tested using the knife-edge scan method at BL13W1 beamline in Shanghai Synchrotron Radiation Facility, which provided the focal widths of 9.2 and 10.4 mu m, and the photon flux gains of 6.9 and 5.4 for the EBDW and UV samples at an X-ray energy with 50 keV, respectively.
会议地点Yamagata Univ, Fac Engn, Yonezawa, JAPAN ; Yamagata Univ, Fac Engn, Yonezawa, JAPAN
电子版国际标准刊号1432-1858 ; 1432-1858
WOS关键词REFRACTIVE LENSES ; REFRACTIVE LENSES ; OPTICS ; OPTICS
会议日期OCT 08-09, 2015 ; OCT 08-09, 2015
WOS研究方向Engineering ; Engineering ; Science & Technology - Other Topics ; Materials Science ; Physics ; Science & Technology - Other Topics ; Materials Science ; Physics
语种英语 ; 英语
WOS记录号WOS:000400083300046 ; WOS:000400083300046
源URL[http://ir.ihep.ac.cn/handle/311005/284964]  
专题高能物理研究所_多学科研究中心
作者单位中国科学院高能物理研究所
推荐引用方式
GB/T 7714		 Liu J,Zhang WW,Chang GC,et al. Fabrication of high energy X-ray compound kinoform lenses using X-ray lithography, Fabrication of high energy X-ray compound kinoform lenses using X-ray lithography[J]. MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS,2017, 2017,23, 23(5):1553-1562, 1553-1562.
APA 刘静.,张伟伟.,常广才.,伊福廷.,Liu, J.,...&Yi, FT.(2017).Fabrication of high energy X-ray compound kinoform lenses using X-ray lithography.MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS,23(5),1553-1562.
MLA 刘静,et al."Fabrication of high energy X-ray compound kinoform lenses using X-ray lithography".MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS 23.5(2017):1553-1562.

入库方式： OAI收割

来源：高能物理研究所

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