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Yttrium-doped TiO2 films prepared by means of DC reactive magnetron sputtering

文献类型：期刊论文

作者Zhang, Wenjie1,2; Wang, Kuanling1; Zhu, Shenglong2; Li, Ying2; Wang, Fuhui2; He, Hongbo3
刊名CHEMICAL ENGINEERING JOURNAL
出版日期2009-12-01
卷号155期号:1-2页码:83-87
关键词Tio2 Film Reactive Magnetron Sputtering Yttrium Doping Photocatalytic Activity Degradation
ISSN号1385-8947
DOI10.1016/j.cej.2009.06.039
英文摘要Y2O3-doped TiO2 films were prepared on glass substrates by means of pulsed DC reactive magnetron sputtering method using titanium and yttrium mixed target. XPS results showed that the films were composed of fully oxidation states of the two elements, Y2O3-TiO2 composite oxides. The existence of yttrium inhibited the crystal growth of TiO2 in the films and Y2O3 mainly presented in its amorphous state in the films. UV-vis transmittance of the films decreased whereas their reflectance increased slightly. Yttrium doping had detrimental effect on photocatalytic activity of the TiO2 films. Photocatalytic degradation efficiency of methyl orange solution declined along with increasing yttrium concentration. (C) 2009 Elsevier B.V. All rights reserved.
WOS研究方向Engineering
语种英语
WOS记录号WOS:000274769500010
出版者ELSEVIER SCIENCE SA
源URL[http://210.72.129.5/handle/321005/121327]  
专题中国科学院沈阳应用生态研究所
通讯作者Zhang, Wenjie
作者单位1.Shenyang Ligong Univ, Sch Environm & Chem Engn, Shenyang 110168, Peoples R China
2.Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China
3.Chinese Acad Sci, Inst Appl Ecol, Shenyang 110016, Peoples R China
推荐引用方式
GB/T 7714		 Zhang, Wenjie,Wang, Kuanling,Zhu, Shenglong,et al. Yttrium-doped TiO2 films prepared by means of DC reactive magnetron sputtering[J]. CHEMICAL ENGINEERING JOURNAL,2009,155(1-2):83-87.
APA Zhang, Wenjie,Wang, Kuanling,Zhu, Shenglong,Li, Ying,Wang, Fuhui,&He, Hongbo.(2009).Yttrium-doped TiO2 films prepared by means of DC reactive magnetron sputtering.CHEMICAL ENGINEERING JOURNAL,155(1-2),83-87.
MLA Zhang, Wenjie,et al."Yttrium-doped TiO2 films prepared by means of DC reactive magnetron sputtering".CHEMICAL ENGINEERING JOURNAL 155.1-2(2009):83-87.

入库方式： OAI收割

来源：沈阳应用生态研究所

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