A method to fabricate high-aspect-ratio microstructures using PMMA photoresist
文献类型：期刊论文
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| 作者 | Zhang TC(张天冲) ; Yi FT(伊福廷); Wang B(王波); Liu J(刘静); Wang YT(王雨婷); Zhou Y(周悦); Zhang, TC; Yi, FT; Wang, B; Liu, J
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| 刊名 | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS
 ; MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS
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| 出版日期 | 2018 ; 2018 |
| 卷号 | 24期号:2页码:1223-1226 |
| ISSN号 | 0946-7076 ; 0946-7076 |
| DOI | 10.1007/s00542-017-3490-x ; 10.1007/s00542-017-3490-x |
| 文献子类 | Article ; Article |
| 英文摘要 | Fabrications of high-aspect-ratio microstructures (HARMS) using negative photoresist have been studied a lot by researchers recently, but the removal of the resist is still a problem. We report a method to fabricate HARMS using PMMA, a positive photoresist. A classical microstructure, densely packed micro square columns, was tried in our study. A top grid made of negative photoresists was employed to join all the separate parts together to prevent them from tilting or clumping. The development and electroplating processes were not influenced by the top grid. Excellent nickel micro-pores-structures were obtained finally, demonstrating that the method is a promising way to fabricate HARMS especially when the resist needs to be removed.; Fabrications of high-aspect-ratio microstructures (HARMS) using negative photoresist have been studied a lot by researchers recently, but the removal of the resist is still a problem. We report a method to fabricate HARMS using PMMA, a positive photoresist. A classical microstructure, densely packed micro square columns, was tried in our study. A top grid made of negative photoresists was employed to join all the separate parts together to prevent them from tilting or clumping. The development and electroplating processes were not influenced by the top grid. Excellent nickel micro-pores-structures were obtained finally, demonstrating that the method is a promising way to fabricate HARMS especially when the resist needs to be removed. |
| 电子版国际标准刊号 | 1432-1858 ; 1432-1858 |
| WOS关键词 | X-RAY-LITHOGRAPHY ; X-RAY-LITHOGRAPHY ; SU-8 PHOTORESIST ; REMOVAL ; RESIST ; SU-8 PHOTORESIST ; REMOVAL ; RESIST |
| WOS研究方向 | Engineering ; Engineering ; Science & Technology - Other Topics ; Materials Science ; Physics ; Science & Technology - Other Topics ; Materials Science ; Physics |
| 语种 | 英语 ; 英语 |
| WOS记录号 | WOS:000423697800041 ; WOS:000423697800041 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/285582]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 通讯作者 | Zhang TC(张天冲) |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Zhang TC,Yi FT,Wang B,et al. A method to fabricate high-aspect-ratio microstructures using PMMA photoresist, A method to fabricate high-aspect-ratio microstructures using PMMA photoresist[J]. MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS,2018, 2018,24, 24(2):1223-1226, 1223-1226. |
| APA | 张天冲.,伊福廷.,王波.,刘静.,王雨婷.,...&Zhou, Y.(2018).A method to fabricate high-aspect-ratio microstructures using PMMA photoresist.MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS,24(2),1223-1226. |
| MLA | 张天冲,et al."A method to fabricate high-aspect-ratio microstructures using PMMA photoresist".MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS 24.2(2018):1223-1226. |
入库方式： OAI收割
来源：高能物理研究所
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