Secondary electron yield of nano-thick aluminum oxide and its application on MCP detector
文献类型：期刊论文
| 作者 | Zhao TC(赵天池); Wang PL(王佩良); Heng, Yuekun ; Wang, Peiliang; Zhao, Tianchi; Yang, Yuzhen; Wen, Kaile; Liu, Shulin; Yan, Baojun; Heng YK(衡月昆)
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| 刊名 | SPRINGER PROCEEDINGS IN PHYSICS
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| 出版日期 | 2018 |
| 卷号 | 213页码:339-343 |
| ISSN号 | 0930-8989 |
| DOI | 10.1007/978-981-13-1316-5_63 |
| 文献子类 | Proceedings Paper |
| 英文摘要 | Nano-thick aluminum oxide thin film was deposited by atomic layer deposition (ALD) technique. The secondary electron properties of such thin film have been studied by pulsed-yield measurement. Conventional lead glass microchannel plate (MCP) was coated with such thin film. The gain, the single electron resolution and the peak-to-valley ratio of the new MCP detector were improved. © Springer Nature Singapore Pte Ltd. 2018. |
| 会议地点 | Beijing, China |
| 电子版国际标准刊号 | 1867-4941 |
| 语种 | 英语 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/286600]  |
| 专题 | 高能物理研究所_实验物理中心 高能物理研究所_多学科研究中心 |
| 通讯作者 | Yan BJ(闫保军) |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Zhao TC,Wang PL,Heng, Yuekun,et al. Secondary electron yield of nano-thick aluminum oxide and its application on MCP detector[J]. SPRINGER PROCEEDINGS IN PHYSICS,2018,213:339-343. |
| APA | 赵天池.,王佩良.,Heng, Yuekun.,Wang, Peiliang.,Zhao, Tianchi.,...&杨玉珍.(2018).Secondary electron yield of nano-thick aluminum oxide and its application on MCP detector.SPRINGER PROCEEDINGS IN PHYSICS,213,339-343. |
| MLA | 赵天池,et al."Secondary electron yield of nano-thick aluminum oxide and its application on MCP detector".SPRINGER PROCEEDINGS IN PHYSICS 213(2018):339-343. |
入库方式： OAI收割
来源：高能物理研究所
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