基于磁流变技术的微孔内壁抛光装置研制及性能研究
文献类型：期刊论文
| 作者 | Yue, Zhou; Yu-Ting, Wang; Fu-Ting, Yi ; Bo, Wang; Jing, Liu; Tian-Chong, Zhang; 张天冲; 刘静; 王波; 伊福廷
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| 刊名 | 表面技术
 |
| 出版日期 | 2018 |
| 卷号 | 47期号:6页码:252-257 |
| DOI | 10.16490/j.cnki.issn.1001-3660.2018.06.036 |
| 其他题名 | Development and performance of equipment for polishing inside walls of micro-holes based on magnetic-field-assisted polishing technology |
| 文献子类 | Article |
| 英文摘要 | The work aims to develop equipment for polishing inside walls of micro-holes based on magnetic-field-assisted polishing technology. The polishing equipment applicable to inside walls of micro-holes was designed and developed by utilizing properties of magnetic-field-assisted polishing solution and drawing on traditional polishing theory. Based upon this polishing equipment, a series of performance studies were performed to the equipment. Polishing studies were applied to porous nickel samples and normal silicon wafers under different conditions, and polishing results were analyzed. Performance study results of the polishing equipment showed that stable gradient alternating magnetic field was generated by the equipment, which coincided with our expectation and could be used for further studies of sample polishing. Though the equipment had no obvious effect on polishing of porous nickel samples, the roughness of silicon wafers decreased from 1.24 nm to 0.56 nm. Polishing studies of silicon wafers showed that the roughness decreased as time advanced. The self-made equipment for polishing inside walls of micro-holes based on magnetic-field-assisted polishing technology can be used for polishing silicon wafers. The relationship between polishing effect and magnetic field control parameters can be explored subsequently, and the polishing equipment can be applied to polishing of samples with micro-hole structure step by step. © 2018 Chongqing Wujiu Periodicals Press. All rights reserved. |
| 电子版国际标准刊号 | 1001-3660 |
| 语种 | 中文 |
| CSCD记录号 | CSCD:6312938 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/286643]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 通讯作者 | 张天冲 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Yue, Zhou,Yu-Ting, Wang,Fu-Ting, Yi,等. 基于磁流变技术的微孔内壁抛光装置研制及性能研究[J]. 表面技术,2018,47(6):252-257. |
| APA | Yue, Zhou.,Yu-Ting, Wang.,Fu-Ting, Yi.,Bo, Wang.,Jing, Liu.,...&周悦.(2018).基于磁流变技术的微孔内壁抛光装置研制及性能研究.表面技术,47(6),252-257. |
| MLA | Yue, Zhou,et al."基于磁流变技术的微孔内壁抛光装置研制及性能研究".表面技术 47.6(2018):252-257. |
入库方式： OAI收割
来源：高能物理研究所
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