Overcoming the Problem of Electrical Contact to Solar Cells Fabricated using Selective-Area Silicon Nanopillars by Cesium Chloride Self-Assembly Lithography as Antireflective Layer
文献类型：期刊论文
| 作者 | Zhang XS(张新帅); Wang YT(王雨婷); Wang B(王波); Zhang TC(张天冲); Yi FT(伊福廷); Liu, J; Zhang, XS; Sun, GJ; Wang, YT; Wang, B |
| 刊名 | ENERGY TECHNOLOGY
 |
| 出版日期 | 2016 |
| 卷号 | 4期号:2页码:298-303 |
| 关键词 | antireflective coatings lithography ohmic contacts silicon nanopillars solar cells |
| ISSN号 | 2194-4288 |
| DOI | 10.1002/ente.201500229 |
| 文献子类 | Article |
| 英文摘要 | Selective-area nanopillar-textured solar cells were fabricated by using a convenient method to overcome the problem of metal contacts on the nanopillars surfaces. A Ti/Ag electrode layer was deposited onto the planar surface after phosphorous doping, and then the nanopillars were fabricated on the surface by using cesium chloride (CsCl) self-assembly lithography. With this method, nanopillars of approximately 150 nm average diameter and heights from 120 to 480 nm [corresponding inductively coupled plasma (ICP) etching time from 15 to 75s] were fabricated on silicon surface as an antireflection layer. Compared with the solar cell with nanopillar arrays covering the entire front surface, the selective-area nanopillars device exhibited better electrode contacts, and consequently better performance: the photovoltaic conversion efficiency (PCE) improved from 12.38 to 15.58%. The heights of the nanopillars also had a significant effect on the PCE of the solar cells, for which the nanopillars of 240 nm height produced the solar cell with the best performance. |
| 电子版国际标准刊号 | 2194-4296 |
| 语种 | 英语 |
| WOS记录号 | WOS:000371149900008 |
| 源URL | [http://ir.ihep.ac.cn/handle/311005/287066]  |
| 专题 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Zhang XS,Wang YT,Wang B,et al. Overcoming the Problem of Electrical Contact to Solar Cells Fabricated using Selective-Area Silicon Nanopillars by Cesium Chloride Self-Assembly Lithography as Antireflective Layer[J]. ENERGY TECHNOLOGY,2016,4(2):298-303. |
| APA | 张新帅.,王雨婷.,王波.,张天冲.,伊福廷.,...&刘静.(2016).Overcoming the Problem of Electrical Contact to Solar Cells Fabricated using Selective-Area Silicon Nanopillars by Cesium Chloride Self-Assembly Lithography as Antireflective Layer.ENERGY TECHNOLOGY,4(2),298-303. |
| MLA | 张新帅,et al."Overcoming the Problem of Electrical Contact to Solar Cells Fabricated using Selective-Area Silicon Nanopillars by Cesium Chloride Self-Assembly Lithography as Antireflective Layer".ENERGY TECHNOLOGY 4.2(2016):298-303. |
入库方式： OAI收割
来源：高能物理研究所
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