Drying of Flowing Liquid Film on Rotating Disk
文献类型：期刊论文
| 作者 | Mizue MUNEKATA1; Hideki OHBA4; Hiroyuki YOSHIKAWAl; Hiroaki KURISHIMA3; Akira NOGUCHI2; Jun NISHIYAMA2 |
| 刊名 | JOURNAL OF THERMAL SCIENCE
 |
| 出版日期 | 2010 |
| 卷号 | 19期号:3页码:234,238 |
| 关键词 | Spin Coating Drying Characteristic Liquid Film Flow Air Boundary Layer Spiral Vortex |
| 英文摘要 | Recently, development of high technology has been required for the formation of uniform thin film in manufacturing processes of semiconductor as the precision instruments become more sophisticated. A method called spin coating is often used for spreading photoresist on a wafer surface and drying photoresist film. In spin coating process, photoresist is uniformly spread on the wafer surface by centrifugal force caused by rotating wafer. However, it is a serious concern that streaky lines, which are caused by spiral vortices, appear on the wafer surface and prevent the formation of uniform film in the case of high rotating speed. On the other hand, in the case oflow rotating speed, a small hump of the film is formed near the wafer edge. The main purpose of this study is to make clear the drying characteristics of the flowing liquid film on the rotating wafer. Temperature distribution of the flowing liquid film is captured by an infrared thermal video camera and radial gradient of the film temperature is introduced in order to evaluate the drying characteristic of the flowing film under steady state condition. Effects of the flow rate of the liquid film on the film temperature are investigated. The film temperature gradually decreases in the radial direction in all cases. At low rotating speed, the radial gradient of the film temperature is almost constant widely. On the other hand, at high rotating speed, the radial gradient of the film temperature takes a certain maximum value. It is found that the location of the gradient peak corresponds with the transition region of the air boundary layer, in which spiral vortices swirl, and shifts to the inner side of the disk with an increase of the liquid flow rate. |
| 公开日期 | 2013-01-06 |
| 源URL | [http://ir.etp.ac.cn/handle/311046/51609]  |
| 专题 | 工程热物理研究所_Journal of Thermal Science |
| 推荐引用方式 GB/T 7714 | Mizue MUNEKATA1,Hideki OHBA4,Hiroyuki YOSHIKAWAl,et al. Drying of Flowing Liquid Film on Rotating Disk[J]. JOURNAL OF THERMAL SCIENCE,2010,19(3):234,238. |
| APA | Mizue MUNEKATA1,Hideki OHBA4,Hiroyuki YOSHIKAWAl,Hiroaki KURISHIMA3,Akira NOGUCHI2,&Jun NISHIYAMA2.(2010).Drying of Flowing Liquid Film on Rotating Disk.JOURNAL OF THERMAL SCIENCE,19(3),234,238. |
| MLA | Mizue MUNEKATA1,et al."Drying of Flowing Liquid Film on Rotating Disk".JOURNAL OF THERMAL SCIENCE 19.3(2010):234,238. |
入库方式： OAI收割
来源：工程热物理研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。