Nanoporous Aluminum by Galvanic Replacement: Dealloying and Inward-Growth Plating
文献类型：期刊论文
| 作者 | Yang, W1; Zheng, XG; Wang, SG; Jin, HJ |
| 刊名 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY
 |
| 出版日期 | 2018-01-19 |
| 卷号 | 165期号:9页码:C492-C496 |
| ISSN号 | 0013-4651 |
| DOI | 10.1149/2.0881809jes |
| 英文摘要 | In aqueous solutions, electro/chemically deposited metals usually grow outward into electrolyte. Here we report that the reduced Al grows inward into the sample, surprisingly, while Mg (in pure Mg and Al2Mg3 alloy) is galvanically replaced with Al in an ionic liquid. The galvanic replacement reaction (GRR) of Al(2)Mg(3 )involves a dealloying process that generates a nanoporous Al skeleton, and simultaneously the inward-growth plating of Al that thickens the Al skeleton. The obtained open nanoporous Al might be interesting for many applications including lithium-ion batteries. The anomalous inward-growth of deposited Al is attributed to the low diffusivity of ionic liquid and the negative charge of reduced species. This dealloying/GRR procedure provides a new route to produce hierarchical nanoporous structure in bulk materials. (C) The Author(s) 2018. Published by ECS. |
| 学科主题 | Electrochemistry ; Materials Science, Coatings & Films |
| 语种 | 英语 |
| WOS记录号 | WOS:000440924800067 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/80237]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 作者单位 | 1.Chinese Acad Sci, Shenyang Natl Lab Mat Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Hefei 230026, Anhui, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yang, W,Zheng, XG,Wang, SG,et al. Nanoporous Aluminum by Galvanic Replacement: Dealloying and Inward-Growth Plating[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY,2018,165(9):C492-C496. |
| APA | Yang, W,Zheng, XG,Wang, SG,&Jin, HJ.(2018).Nanoporous Aluminum by Galvanic Replacement: Dealloying and Inward-Growth Plating.JOURNAL OF THE ELECTROCHEMICAL SOCIETY,165(9),C492-C496. |
| MLA | Yang, W,et al."Nanoporous Aluminum by Galvanic Replacement: Dealloying and Inward-Growth Plating".JOURNAL OF THE ELECTROCHEMICAL SOCIETY 165.9(2018):C492-C496. |
入库方式： OAI收割
来源：金属研究所
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