Optimization of hetero-epitaxial growth for the threading dislocation density reduction of germanium epilayers
文献类型:期刊论文
作者 | Haining Chong ; Zhewei Wang ; Chaonan Chen ; Zemin Xu ; Ke Wu ; Lan Wu ; Bo Xu ; Hui Ye |
刊名 | Journal of Crystal Growth
![]() |
出版日期 | 2018 |
卷号 | 488页码:8–15 |
源URL | [http://ir.semi.ac.cn/handle/172111/29124] ![]() |
专题 | 半导体研究所_中科院半导体材料科学重点实验室 |
推荐引用方式 GB/T 7714 | Haining Chong ; Zhewei Wang ; Chaonan Chen ; Zemin Xu ; Ke Wu ; Lan Wu ; Bo Xu ; Hui Ye. Optimization of hetero-epitaxial growth for the threading dislocation density reduction of germanium epilayers[J]. Journal of Crystal Growth,2018,488:8–15. |
APA | Haining Chong ; Zhewei Wang ; Chaonan Chen ; Zemin Xu ; Ke Wu ; Lan Wu ; Bo Xu ; Hui Ye.(2018).Optimization of hetero-epitaxial growth for the threading dislocation density reduction of germanium epilayers.Journal of Crystal Growth,488,8–15. |
MLA | Haining Chong ; Zhewei Wang ; Chaonan Chen ; Zemin Xu ; Ke Wu ; Lan Wu ; Bo Xu ; Hui Ye."Optimization of hetero-epitaxial growth for the threading dislocation density reduction of germanium epilayers".Journal of Crystal Growth 488(2018):8–15. |
入库方式: OAI收割
来源:半导体研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。