Spectroscopic study on pulsed laser ablation of graphite target in ECR nitrogen plasma for carbon nitride film deposition
文献类型：期刊论文
| 作者 | Shen, X. K.; Sun, J.; Xu, N.; Ying, Z. F.; Shi, L. Q.; Wu, A. M.; Gong, Z. S.; Wu, J. D. |
| 刊名 | DIAMOND AND RELATED MATERIALS
 |
| 出版日期 | 2006-09-01 |
| 卷号 | 15页码:1350-1356 |
| 关键词 | plume emission carbon nitride pulsed laser ablation electron cyclotron resonance microwave discharge nitrogen plasma |
| ISSN号 | 0925-9635 |
| DOI | 10.1016/j.diamond.2005.10.015 |
| 英文摘要 | The influence of nitrogen plasma generated by electron cyclotron resonance (ECR) microwave discharge on deposition of carbon nitride films by means of ECR plasma assisted reactive pulsed laser deposition was investigated by a comparative study on the optical emission of the plume produced by pulsed laser ablation of a graphite target in ECR nitrogen plasma, in vacuum and in low-pressure nitrogen gas ambient. Spatial and temporal spectroscopic measurements show that in vacuum optical emission lines originating from carbon atoms and ions dominate the plume emission, while in low-pressure N(2) ambient weak CN emissions appear. In nitrogen plasma, the plume emission exhibits itself very differently. It evolves from consisting of emissions almost from mono-atomic carbon atoms and ions to being dominated by emissions from CN molecules. The presence of the reactive nitrogen plasma greatly enhanced the CN emissions and eliminated the emission lines from carbon atoms and ions. The appearance of the CN emissions occurs after the emissions from carbon atoms and ions have decayed considerably, indicating that the dominant mechanism for the formation of CN molecules is gaseous phase reaction. Carbon nitride films with nitrogen content of about 40 at.% were obtained. Possible processes for CN molecule formation in gaseous phase and mechanisms responsible for efficient nitrogen incorporation and carbon nitride film deposition were suggested. (c) 2005 Elsevier B.V. All rights reserved. |
| WOS关键词 | CNX THIN-FILMS ; EMISSION |
| WOS研究方向 | Materials Science |
| 语种 | 英语 |
| WOS记录号 | WOS:000240047300025 |
| 出版者 | ELSEVIER SCIENCE SA |
| 源URL | [http://119.78.100.186/handle/113462/26056]  |
| 专题 | 中国科学院近代物理研究所 |
| 通讯作者 | Wu, J. D. |
| 作者单位 | 1.Fudan Univ, Dept Opt Sci & Engn, State Key Lab Adv Photon Mat & Devices, Shanghai 200433, Peoples R China 2.Fudan Univ, Inst Modern Phys, Shanghai 200433, Peoples R China |
| 推荐引用方式 GB/T 7714 | Shen, X. K.,Sun, J.,Xu, N.,et al. Spectroscopic study on pulsed laser ablation of graphite target in ECR nitrogen plasma for carbon nitride film deposition[J]. DIAMOND AND RELATED MATERIALS,2006,15:1350-1356. |
| APA | Shen, X. K..,Sun, J..,Xu, N..,Ying, Z. F..,Shi, L. Q..,...&Wu, J. D..(2006).Spectroscopic study on pulsed laser ablation of graphite target in ECR nitrogen plasma for carbon nitride film deposition.DIAMOND AND RELATED MATERIALS,15,1350-1356. |
| MLA | Shen, X. K.,et al."Spectroscopic study on pulsed laser ablation of graphite target in ECR nitrogen plasma for carbon nitride film deposition".DIAMOND AND RELATED MATERIALS 15(2006):1350-1356. |
入库方式： OAI收割
来源：近代物理研究所
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