Anisotropic diffusion of Cu adatoms on strained Cu (111) surface
文献类型：期刊论文
| 作者 | Wang, Y. X.; Pan, Z. Y.; Liu, T. J.; Jiang, X. M.; Zhou, L.; Zhu, J. |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2006-12-15 |
| 卷号 | 253页码:1748-1752 |
| 关键词 | diffusion of adatoms strained Cu (111) surface thin film growth molecular dynamic simulation |
| ISSN号 | 0169-4332 |
| DOI | 10.1016/j.apsusc.2006.03.007 |
| 英文摘要 | Diffusion of Cu atoms on a strained Cu (I 1 1) surface was studied by molecular dynamic simulation using an EAM potential. The anisotropic diffusion behaviour is found when the uniaxial strain is imposed on the surface, which does not exist under the biaxial strain. The migration of the adatom is suppressed along the tensile strain direction. The results suggest that different island morphology can be obtained by controlling anisotropic diffusion of adatoms on the strained surfaces during film growth. (c) 2006 Elsevier B.V. All rights reserved. |
| WOS关键词 | MOLECULAR-DYNAMICS ; SELF-DIFFUSION ; GROWTH ; ISLANDS |
| WOS研究方向 | Chemistry ; Materials Science ; Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000243244200011 |
| 出版者 | ELSEVIER SCIENCE BV |
| 源URL | [http://119.78.100.186/handle/113462/26977]  |
| 专题 | 中国科学院近代物理研究所 |
| 通讯作者 | Wang, Y. X. |
| 作者单位 | Fudan Univ, Inst Modern Phys, Shanghai 200433, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wang, Y. X.,Pan, Z. Y.,Liu, T. J.,et al. Anisotropic diffusion of Cu adatoms on strained Cu (111) surface[J]. APPLIED SURFACE SCIENCE,2006,253:1748-1752. |
| APA | Wang, Y. X.,Pan, Z. Y.,Liu, T. J.,Jiang, X. M.,Zhou, L.,&Zhu, J..(2006).Anisotropic diffusion of Cu adatoms on strained Cu (111) surface.APPLIED SURFACE SCIENCE,253,1748-1752. |
| MLA | Wang, Y. X.,et al."Anisotropic diffusion of Cu adatoms on strained Cu (111) surface".APPLIED SURFACE SCIENCE 253(2006):1748-1752. |
入库方式： OAI收割
来源：近代物理研究所
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