中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Optical and mass spectroscopy measurements of Ar/CH4/H-2 microwave plasma for nano-crystalline diamond film deposition

文献类型:期刊论文

作者Zhou, Haiyang; Watanabe, Jun; Miyake, Masato; Ogino, Akihisa; Nagatsu, Masaaki; Zhan, Rujuan
刊名DIAMOND AND RELATED MATERIALS
出版日期2007-04-01
卷号16页码:675-678
关键词nano-crystalline diamond film plasma CVD optical emission QMS
ISSN号0925-9635
DOI10.1016/j.diamond.2006.11.074
英文摘要Nano-crystalline diamond (NCD) thin film with grains of about 5-100 nm in size attracts much attention as new functional materials in various industrial fields, due to its unique properties that are different from the conventional microcrystalline diamond (MCD) thin film. Most commonly, NCD film can be synthesized using CH4/Ar plasma with/without a small amount of hydrogen gas added. In this study, we carried out the measurements of quadrupole mass spectroscopy (QMS) and optical emission spectroscopy (OES) to investigate CH4/H-2/Ar mixture plasma in detail. Combined with our experimental results of NCD film synthesis, the mechanism of CH4 dissociation and the precursors of NCD were further explored. (C) 2006 Elsevier B.V. All rights reserved.
WOS关键词ULTRANANOCRYSTALLINE DIAMOND ; GAS-MIXTURES ; C-2 ; DENSITY ; GROWTH ; MECHANISM ; EMISSION ; HYDROGEN ; METHANE
WOS研究方向Materials Science
语种英语
WOS记录号WOS:000246608200004
出版者ELSEVIER SCIENCE SA
源URL[http://119.78.100.186/handle/113462/27198]  
专题中国科学院近代物理研究所
通讯作者Nagatsu, Masaaki
作者单位1.Shizuoka Univ, Grad Sch Sci & Technol, Hamamatsu, Shizuoka 4328561, Japan
2.Univ Sci & Technol China, Dept Modern Phys, CAS, Key Lab Basic Plasma Phys, Anhua 230026, Peoples R China
推荐引用方式
GB/T 7714
Zhou, Haiyang,Watanabe, Jun,Miyake, Masato,et al. Optical and mass spectroscopy measurements of Ar/CH4/H-2 microwave plasma for nano-crystalline diamond film deposition[J]. DIAMOND AND RELATED MATERIALS,2007,16:675-678.
APA Zhou, Haiyang,Watanabe, Jun,Miyake, Masato,Ogino, Akihisa,Nagatsu, Masaaki,&Zhan, Rujuan.(2007).Optical and mass spectroscopy measurements of Ar/CH4/H-2 microwave plasma for nano-crystalline diamond film deposition.DIAMOND AND RELATED MATERIALS,16,675-678.
MLA Zhou, Haiyang,et al."Optical and mass spectroscopy measurements of Ar/CH4/H-2 microwave plasma for nano-crystalline diamond film deposition".DIAMOND AND RELATED MATERIALS 16(2007):675-678.

入库方式: OAI收割

来源:近代物理研究所

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