Role of bias frequency in a dual electron cyclotron resonance-radio-frequency hybrid plasma
文献类型：期刊论文
| 作者 | Wang, L.; Ke, B.; Ni, T. L.; Ding, F.; Chen, M. D.; Zhu, X. D.; Zhou, H. Y.; Wen, X. H. |
| 刊名 | VACUUM
 |
| 出版日期 | 2009-09-18 |
| 卷号 | 84页码:348-351 |
| 关键词 | Dual ECR-rf plasma Simulation Bias frequency |
| ISSN号 | 0042-207X |
| DOI | 10.1016/j.vacuum.2009.07.009 |
| 英文摘要 | The effects of an rf-bias on the At plasma in the dual ECR-rf plasma reactor were investigated both experimentally and numerically. It is demonstrated that the application of 13.56-MHz rf bias significantly modifies the characteristics of bulk plasma based on Langnuir probe measurements, which is attributed to the oscillation of rf sheath. Under the rf bias of 400 kHz, there exists negligible reaction between the ECR plasma and the low-frequency bias. By using a hybrid model with simplified rf sheath as the boundary condition, the characteristic of the dual ECR-rf plasma was simulated. Modeling results are consistent qualitatively with experimental measurements. (C) 2009 Elsevier Ltd. All rights reserved. |
| WOS关键词 | ECR PLASMA ; DISCHARGE ; PARAMETERS ; DEPOSITION ; SUBSTRATE ; REACTOR |
| 资助项目 | National Natural Science Foundation[10635010] ; People's Republic of China and National Basic Research Program of China[2008CB717800] |
| WOS研究方向 | Materials Science ; Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000270626000010 |
| 出版者 | PERGAMON-ELSEVIER SCIENCE LTD |
| 资助机构 | National Natural Science Foundation ; People's Republic of China and National Basic Research Program of China |
| 源URL | [http://119.78.100.186/handle/113462/31150]  |
| 专题 | 中国科学院近代物理研究所 |
| 通讯作者 | Zhu, X. D. |
| 作者单位 | Univ Sci & Technol China, CAS, Key Lab Basic Plasma Phys, Dept Modern Phys, Hefei 230026, Anhui, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wang, L.,Ke, B.,Ni, T. L.,et al. Role of bias frequency in a dual electron cyclotron resonance-radio-frequency hybrid plasma[J]. VACUUM,2009,84:348-351. |
| APA | Wang, L..,Ke, B..,Ni, T. L..,Ding, F..,Chen, M. D..,...&Wen, X. H..(2009).Role of bias frequency in a dual electron cyclotron resonance-radio-frequency hybrid plasma.VACUUM,84,348-351. |
| MLA | Wang, L.,et al."Role of bias frequency in a dual electron cyclotron resonance-radio-frequency hybrid plasma".VACUUM 84(2009):348-351. |
入库方式： OAI收割
来源：近代物理研究所
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