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Silicon nitride films synthesized by reactive pulsed laser deposition in an electron cyclotron resonance nitrogen plasma

文献类型：期刊论文

作者Wu, JD; Sun, J; Zhong, XX; Zhou, ZY; Wu, CZ; Li, FM
刊名THIN SOLID FILMS
出版日期1999-08-15
卷号350页码:101-105
关键词reactive pulsed laser deposition electron cyclotron resonance plasma silicon nitride
ISSN号0040-6090
英文摘要We report a him synthesis method called electron cyclotron resonance (ECR) plasma aided reactive pulsed laser deposition. Silicon nitride films were synthesized at low temperature by means of laser ablation of a silicon target in an ECR microwave discharge in pure nitrogen gas. It is found that silicon and nitrogen are well-distributed in the deposited films with a composition of near stoichiometric Si3N4. Optical emission spectroscopy indicated that nitrogen in the ECR plasma was highly activated. The presence of the ECR nitrogen plasma during the deposition is considered to lead to enhanced nitridation of the ablated silicon in the plume as well as at the substrate, and to be responsible for the effective incorporation of nitrogen in the films. (C) 1999 Elsevier Science S.A. All rights reserved.
WOS关键词CHEMICAL-VAPOR-DEPOSITION ; ECR PLASMA ; THIN-FILMS ; SI
WOS研究方向Materials Science ; Physics
语种英语
WOS记录号WOS:000082023400018
出版者ELSEVIER SCIENCE SA
源URL[http://119.78.100.186/handle/113462/36259]  
专题中国科学院近代物理研究所
通讯作者Wu, JD
作者单位1.Fudan Univ, Dept Phys, State Key Lab Mat Modificat Laser Ion & Electron, Shanghai 200433, Peoples R China
2.Fudan Univ, Inst Modern Phys, Shanghai 200433, Peoples R China
推荐引用方式
GB/T 7714		 Wu, JD,Sun, J,Zhong, XX,et al. Silicon nitride films synthesized by reactive pulsed laser deposition in an electron cyclotron resonance nitrogen plasma[J]. THIN SOLID FILMS,1999,350:101-105.
APA Wu, JD,Sun, J,Zhong, XX,Zhou, ZY,Wu, CZ,&Li, FM.(1999).Silicon nitride films synthesized by reactive pulsed laser deposition in an electron cyclotron resonance nitrogen plasma.THIN SOLID FILMS,350,101-105.
MLA Wu, JD,et al."Silicon nitride films synthesized by reactive pulsed laser deposition in an electron cyclotron resonance nitrogen plasma".THIN SOLID FILMS 350(1999):101-105.

入库方式： OAI收割

来源：近代物理研究所

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