Deposition and characterization of Ti2AlC MAX phase and Ti3AlC thin films by magnetron sputtering
文献类型：期刊论文
| 作者 | Su, Ranran1; Zhang, Hongliang1; O'Connor, D. J.2; Shi, Liqun1; Meng, Xiangpeng1; Zhang, Haibin3 |
| 刊名 | MATERIALS LETTERS
 |
| 出版日期 | 2016-09-15 |
| 卷号 | 179页码:194-197 |
| 关键词 | Thin films Ti2AlC Deposition Ceramics Ti3AlC |
| ISSN号 | 0167-577X |
| DOI | 10.1016/j.matlet.2016.05.086 |
| 英文摘要 | We have deposited phase-pure Ti2AlC and Ti3AlC thin films directly on MgO (100) substrates by reactive radio frequency (RF) magnetron sputtering above 600 degrees C for the first time. As-deposited films were characterized with grazing incidence X-ray diffraction (GIXRD), Rutherford backscattering (RBS) and scanning electron microscope (SEM). Single-phase Ti2AlC thin film could be synthesized above 600 degrees C. RBS results indicates a near-stoichiometric Ti2AlC composition is required to prepare these phase-pure films. The films are polycrystalline and displayed arbitrarily oriented hexagonal laminal grains with lateral dimension varying from 150 nm to 400 nm for deposition temperatures ranging from 600 degrees C to 710 degrees C. The Perovskite phase Ti3AlC was observed in the Ti2AlC sample when the sputtering power is 90 W at 615 degrees C and a single-phase Ti3AlC film was formed at 110 W. (C) 2016 Elsevier B.V. All rights reserved. |
| WOS关键词 | DEGREES-C ; TI ; CR2ALC ; STABILITY ; TI3SIC2 |
| 资助项目 | National Nature Science Foundation of China[11375046] |
| WOS研究方向 | Materials Science ; Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000376991800048 |
| 出版者 | ELSEVIER SCIENCE BV |
| 资助机构 | National Nature Science Foundation of China |
| 源URL | [http://119.78.100.186/handle/113462/42762]  |
| 专题 | 中国科学院近代物理研究所 |
| 通讯作者 | Shi, Liqun; Zhang, Haibin |
| 作者单位 | 1.Fudan Univ, Inst Modern Phys, Appl Ion Beam Phys Lab, Shanghai 200433, Peoples R China 2.Univ Newcastle, Sch Math & Phys Sci, Callaghan, NSW 2308, Australia 3.China Acad Engn Phys, Inst Nucl Phys & Chem, Mianyang 621000, Peoples R China |
| 推荐引用方式 GB/T 7714 | Su, Ranran,Zhang, Hongliang,O'Connor, D. J.,et al. Deposition and characterization of Ti2AlC MAX phase and Ti3AlC thin films by magnetron sputtering[J]. MATERIALS LETTERS,2016,179:194-197. |
| APA | Su, Ranran,Zhang, Hongliang,O'Connor, D. J.,Shi, Liqun,Meng, Xiangpeng,&Zhang, Haibin.(2016).Deposition and characterization of Ti2AlC MAX phase and Ti3AlC thin films by magnetron sputtering.MATERIALS LETTERS,179,194-197. |
| MLA | Su, Ranran,et al."Deposition and characterization of Ti2AlC MAX phase and Ti3AlC thin films by magnetron sputtering".MATERIALS LETTERS 179(2016):194-197. |
入库方式： OAI收割
来源：近代物理研究所
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