Additivity of kinetic and potential energy contributions in modification of graphene supported on SiO2
文献类型：期刊论文
| 作者 | Zhang, Xitong1,2,3; Zhao, Shijun1,2,3; Wang, Yuyu4; Xue, Jianming1,2,3 |
| 刊名 | NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
 |
| 出版日期 | 2017-04-15 |
| 卷号 | 397页码:62-66 |
| 关键词 | Graphene Irradiation Track Defect |
| ISSN号 | 0168-583X |
| DOI | 10.1016/j.nimb.2017.02.001 |
| 英文摘要 | The damage production induced by MeV highly charged ions (HCI) irradiations in graphene supported on a SiO2 substrate is investigated using molecular dynamics method. We get results in agreement with our recent experiments. We find that the electronic energy loss and potential energy deposition have similar effects on the defects creation in SiO2 substrate-supported graphene and both mechanisms of energy deposition seem to contribute in an additive way. The influences of the energy deposition depth and radius are studied. Only the energy deposited below the surface within 2.5 nm will induce the damage in graphene. Hence, the HCI can be a powerful tool to induce defects in graphene without causing deep damage of the substrate. When charge of incident Xeq+ is above 30, a nanopore is formed and the size of nanopore in graphene can be controlled by changing the incident charge state. (C) 2017 Elsevier B.V. All rights reserved. |
| WOS关键词 | SWIFT HEAVY-IONS ; FIELD-EFFECT TRANSISTORS ; HIGHLY-CHARGED IONS ; DEFECT FORMATION ; IRRADIATION ; SUBSTRATE ; GRAPHITE ; SYSTEMS ; LENGTH |
| 资助项目 | NSFC[91226202] ; NSFC[91426304] |
| WOS研究方向 | Instruments & Instrumentation ; Nuclear Science & Technology ; Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000399627100009 |
| 出版者 | ELSEVIER SCIENCE BV |
| 资助机构 | NSFC |
| 源URL | [http://119.78.100.186/handle/113462/44716]  |
| 专题 | 中国科学院近代物理研究所 |
| 通讯作者 | Xue, Jianming |
| 作者单位 | 1.Peking Univ, Sch Phys, State Key Lab Nucl Phys & Technol, Beijing 100871, Peoples R China 2.Peking Univ, CAPT, HEDPS, Beijing 100871, Peoples R China 3.Peking Univ, IFSA Collaborat Innovat Ctr MoE, Coll Engn, Beijing 100871, Peoples R China 4.Chinese Acad Sci, Inst Modem Phys, Lanzhou 730000, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhang, Xitong,Zhao, Shijun,Wang, Yuyu,et al. Additivity of kinetic and potential energy contributions in modification of graphene supported on SiO2[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,2017,397:62-66. |
| APA | Zhang, Xitong,Zhao, Shijun,Wang, Yuyu,&Xue, Jianming.(2017).Additivity of kinetic and potential energy contributions in modification of graphene supported on SiO2.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,397,62-66. |
| MLA | Zhang, Xitong,et al."Additivity of kinetic and potential energy contributions in modification of graphene supported on SiO2".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 397(2017):62-66. |
入库方式： OAI收割
来源：近代物理研究所
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