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Synthesis of Cr2AlC thin films by reactive magnetron sputtering

文献类型：期刊论文

作者Su, Ranran1; Zhang, Hongliang1; Meng, Xiangpeng2; Shi, Liqun1; Liu, Chaozhuo2
刊名FUSION ENGINEERING AND DESIGN
出版日期2017-12-01
卷号125页码:562-566
关键词MAX phase Cr2AlC Film Magnetron sputtering Fusion
ISSN号0920-3796
DOI10.1016/j.fusengdes.2017.04.129
英文摘要Cr2AlC thin films are deposited on MgO (100) and Al2O3 (0001) substrates with reactive radio frequency (RF) magnetron sputtering for the first time. Single phase Cr2AlC films are synthesized at a substrate temperature of 480 degrees C and deposition power of 70W, with a preferred orientation. The film is polycrystalline with a dense microstructure. The preferred orientation disappears and AlCr2 impurity emerges as the temperature and sputtering power rise during the deposition. When the sputtering power is 90W or higher, the phase becomes totally AlCr2 due to C loss. The Cr2AlC phase is stable in vacuum for temperatures up to 700 degrees C, but the phase starts to decompose into Cr7C3 at 800 degrees C. (C) 2017 Elsevier B.V. All rights reserved.
WOS关键词HIGH-TEMPERATURE OXIDATION ; AB-INITIO CALCULATIONS ; SELECT MAX PHASES ; M(N+1)AX(N) PHASES ; NEUTRON-IRRADIATION ; ELASTIC PROPERTIES ; HEAT-TREATMENT ; TI2ALC ; CERAMICS ; TI3SIC2
资助项目National Nature Science Foundation of China[11375046]
WOS研究方向Nuclear Science & Technology
语种英语
WOS记录号WOS:000419407300088
出版者ELSEVIER SCIENCE SA
资助机构National Nature Science Foundation of China
源URL[http://119.78.100.186/handle/113462/47113]  
专题中国科学院近代物理研究所
通讯作者Shi, Liqun; Liu, Chaozhuo
作者单位1.Fudan Univ, Inst Modern Phys, Appl Ion Beam Phys Lab, Shanghai 20043, Peoples R China
2.China Univ Petr, Dept Phys, Qingdao 102249, Shandong, Peoples R China
推荐引用方式
GB/T 7714		 Su, Ranran,Zhang, Hongliang,Meng, Xiangpeng,et al. Synthesis of Cr2AlC thin films by reactive magnetron sputtering[J]. FUSION ENGINEERING AND DESIGN,2017,125:562-566.
APA Su, Ranran,Zhang, Hongliang,Meng, Xiangpeng,Shi, Liqun,&Liu, Chaozhuo.(2017).Synthesis of Cr2AlC thin films by reactive magnetron sputtering.FUSION ENGINEERING AND DESIGN,125,562-566.
MLA Su, Ranran,et al."Synthesis of Cr2AlC thin films by reactive magnetron sputtering".FUSION ENGINEERING AND DESIGN 125(2017):562-566.

入库方式： OAI收割

来源：近代物理研究所

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