Electronic sputtering of metals and insulators by swift heavy ions
文献类型：会议论文
| 作者 | Toulemonde, M; Assmann, W; Trautmann, C; Gruner, F; Mieskes, HD; Kucal, H; Wang, ZG |
| 出版日期 | 2003-12 |
| 卷号 | 212 |
| DOI | 10.1016/S0168-583X(03)01721-X |
| 页码 | 346-357 |
| 英文摘要 | Angular distributions and total yields of atoms sputtered from crystals of LiF and alpha-SiO(2) quartz and from Ti, Zr and Au targets are measured under the irradiation of different heavy ions in the electronic energy loss (S(e)) regime. The angular distributions for Si atoms sputtered from SiO(2) are nearly isotropic (similar to cos theta), whereas all metallic targets follow an overcosine law (similar to cos(3) theta). In case of LiF, an isotropic distribution is found to be superimposed by an anisotropic jet-like component peaked normal to the sample surface. The sputter yield of different targets varies by several orders of magnitude from 10 for metals to 10(5) for LiF. As a function of the electronic energy loss of the projectiles, the total sputter yield follows a (S(e))(4) law for LiF. Experimental sputter yields are analyzed within the inelastic thermal spike approach. Good agreement is obtained for alpha-SiO(2) when using the same set of parameters which successfully describe track formation. To model sputtering yield in metals, both contributions of electronic and nuclear collisions have to be taken into account. The sputtering mechanism of LiF seems to be more complex, possibly combining a hydrodynamic process generated by a transient thermal effect associated with a decrease of the surface binding energy. (C) 2003 Elsevier B.V. All rights reserved. |
| 会议录 | NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
 |
| 会议录出版者 | ELSEVIER SCIENCE BV |
| 会议录出版地 | PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS |
| 语种 | 英语 |
| WOS研究方向 | Instruments & Instrumentation ; Nuclear Science & Technology ; Physics |
| WOS记录号 | WOS:000186673700058 |
| 源URL | [http://119.78.100.186/handle/113462/57673]  |
| 专题 | 中国科学院近代物理研究所 |
| 通讯作者 | Toulemonde, M |
| 作者单位 | 1.CIRIL, Lab Commun CEA, CNRS, ISMRA, F-14070 Caen 5, France 2.LMU Munchen, Sekt Phys, D-85748 Garching, Germany 3.GSI, Mat Forsch, D-64291 Darmstadt, Germany 4.Chinese Acad Sci, IMP, Lanzhou 730000, Peoples R China |
| 推荐引用方式 GB/T 7714 | Toulemonde, M,Assmann, W,Trautmann, C,et al. Electronic sputtering of metals and insulators by swift heavy ions[C]. 见:. |
入库方式： OAI收割
来源：近代物理研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。