中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Damage accumulation in gallium nitride irradiated with various energetic heavy ions

文献类型:会议论文

作者Zhang, C. H.; Song, Y.; Sun, Y. M.; Chen, H.; Yang, Y. T.; Zhou, L. H.; Jin, Y. F.
出版日期2007-03
关键词GaN swift heavv ions slow highly-charged ions RBS-channeling Raman scattering TEM
卷号256
期号1
DOI10.1016/j.nimb.2006.12.003
页码199-206
英文摘要In this work a study of damage production in gallium nitride via elastic collision process (nuclear energy deposition) and inelastic collision process (electronic energy deposition) using various heavy ions is presented. Ordinary low-energy heavy ions (Fe+ and Mo+ ions of 110 keV), swift heavy ions (Pb-208(27+) ions of 1.1 MeV/u) and slow highly-charged heavy ions (Xen+ ions of 180 keV) were employed in the irradiation. Damage accumulation in the GaN crystal films as a function of ion fluence and temperature was studied with RBS-channeling technique, Raman scattering technique, scanning electron microscopy (SEM) and transmission electron microscopy (TEM).
会议录NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
会议录出版者ELSEVIER SCIENCE BV
会议录出版地PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS
语种英语
WOS研究方向Instruments & Instrumentation ; Nuclear Science & Technology ; Physics
WOS记录号WOS:000245959300041
源URL[http://119.78.100.186/handle/113462/57719]  
专题中国科学院近代物理研究所
通讯作者Zhang, C. H.
作者单位1.Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China
推荐引用方式
GB/T 7714
Zhang, C. H.,Song, Y.,Sun, Y. M.,et al. Damage accumulation in gallium nitride irradiated with various energetic heavy ions[C]. 见:.

入库方式: OAI收割

来源:近代物理研究所

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