中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Structural modification of C-doped SiO2 induced by swift heavy ion irradiations

文献类型:会议论文

作者Wang, Z. G.; Zhao, Z. M.; Benyagoub, A.; Toulemonde, M.; Levesque, F.; Song, Y.; Jin, Y. F.; Sun, Y. M.; Liu, C. B.; Zang, H.
出版日期2007-03
关键词swift heavy ion irradiations C-doped SiO2 structural modification FTIR and Raman spectroscopes
卷号256
期号1
DOI10.1016/j.nimb.2006.12.071
页码288-292
英文摘要Thermally grown amorphous SiO2 samples were implanted at room temperature (RT) with 120 keV C-ions to a dose ranging from 1.0 x 10(16) to 8.6 x 10(17)C ions/cm(2), then irradiated at RT with 950 MeV Pb, 345 or 1754 MeV Xe ions to a fluence in the region from 1.0 x 10(11) to 3.8 x 10(12) ions/cm(2), respectively. The irradiated samples were investigated using micro-FTIR and micro-Raman spectroscopes. It was found that new chemical bonds such as Si-C, C=C(O), C C and Si(C)-O-C bonds formed significantly in the C-doped SiO2 films after heavy ion irradiations. The evolution of Si-O-C bonds and possible mechanism of structural modification in C-doped SiO2 induced by swift heavy ion irradiations were discussed. (c) 2006 Elsevier B.V. All rights reserved.
会议录NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
会议录出版者ELSEVIER SCIENCE BV
会议录出版地PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS
语种英语
WOS研究方向Instruments & Instrumentation ; Nuclear Science & Technology ; Physics
WOS记录号WOS:000245959300058
源URL[http://119.78.100.186/handle/113462/57818]  
专题中国科学院近代物理研究所
通讯作者Wang, Z. G.
作者单位1.Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China
3.CIRIL, F-14070 Caen, France
推荐引用方式
GB/T 7714
Wang, Z. G.,Zhao, Z. M.,Benyagoub, A.,et al. Structural modification of C-doped SiO2 induced by swift heavy ion irradiations[C]. 见:.

入库方式: OAI收割

来源:近代物理研究所

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