Potential sputtering by Highly Charged Ion bombardment on Au surface
文献类型:会议论文
作者 | Cheng, R.1; Peng, H. B.1; Liu, S. J.1; Han, Y. C.1; Zong, P. F.1; Zhao, Y. T.2; Wang, T. S.1 |
出版日期 | 2010-03 |
关键词 | Highly charged ions potential sputtering Au level energy matching |
卷号 | 834 |
期号 | 1-4 |
DOI | 10.1016/j.nuclphysa.2010.01.140 |
页码 | 764C-766C |
英文摘要 | The sputtered particle yields produced by Pb(q+) (q=4-36) with constant kinetic energy bombardment on An surface were measured. The sputtering Could be separated to two parts: no potential sputtering is observed when q<24 (E(pot) = 9.6 keV) and the sputtering yield increases with E(pot)(1.2) for the higher charge states of q >= 24. The potential sputtering is mainly contributed by the relaxation of electronic excitations on target surface produced by the potential energy transfer from projectile to target atoms. |
会议录 | NUCLEAR PHYSICS A |
会议录出版者 | ELSEVIER SCIENCE BV |
会议录出版地 | PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS |
语种 | 英语 |
WOS研究方向 | Physics |
WOS记录号 | WOS:000275930800192 |
源URL | [http://119.78.100.186/handle/113462/58302] |
专题 | 中国科学院近代物理研究所 |
通讯作者 | Cheng, R. |
作者单位 | 1.Lanzhou Univ, Sch Nucl Sci & Technol, Lanzhou 730000, Peoples R China 2.Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Peoples R China |
推荐引用方式 GB/T 7714 | Cheng, R.,Peng, H. B.,Liu, S. J.,et al. Potential sputtering by Highly Charged Ion bombardment on Au surface[C]. 见:. |
入库方式: OAI收割
来源:近代物理研究所
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