Potential sputtering by Highly Charged Ion bombardment on Au surface
文献类型：会议论文
| 作者 | Cheng, R.2; Zhao, Y. T.1; Wang, T. S.2; Zong, P. F.2; Han, Y. C.2; Liu, S. J.2; Peng, H. B.2 |
| 出版日期 | 2010-03 |
| 关键词 | Highly charged ions potential sputtering Au level energy matching |
| 卷号 | 834 |
| 期号 | 1-4 |
| DOI | 10.1016/j.nuclphysa.2010.01.140 |
| 页码 | 764C-766C |
| 英文摘要 | The sputtered particle yields produced by Pb(q+) (q=4-36) with constant kinetic energy bombardment on An surface were measured. The sputtering Could be separated to two parts: no potential sputtering is observed when q<24 (E(pot) = 9.6 keV) and the sputtering yield increases with E(pot)(1.2) for the higher charge states of q >= 24. The potential sputtering is mainly contributed by the relaxation of electronic excitations on target surface produced by the potential energy transfer from projectile to target atoms. |
| 会议录 | NUCLEAR PHYSICS A
 |
| 会议录出版者 | ELSEVIER SCIENCE BV |
| 会议录出版地 | PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS |
| 语种 | 英语 |
| WOS研究方向 | Physics |
| WOS记录号 | WOS:000275930800192 |
| 源URL | [http://119.78.100.186/handle/113462/58301]  |
| 专题 | 中国科学院近代物理研究所 |
| 通讯作者 | Cheng, R. |
| 作者单位 | 1.Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Peoples R China 2.Lanzhou Univ, Sch Nucl Sci & Technol, Lanzhou 730000, Peoples R China |
| 推荐引用方式 GB/T 7714 | Cheng, R.,Zhao, Y. T.,Wang, T. S.,et al. Potential sputtering by Highly Charged Ion bombardment on Au surface[C]. 见:. |
入库方式： OAI收割
来源：近代物理研究所
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