中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Photoluminescence from C+-implanted SiO2 films after swift heavy ion irradiations

文献类型:会议论文

作者Wang, Z.G.; Liu, J.; Zhu, Z.Y.; Jin, Y.F.; Xie, E.Q.; Zhu, T.W.; Chen, X.X.; Sun, Y.M.; Hou, M.D.
出版日期2002
卷号191
期号1-4
DOI10.1016/S0168-583X(02)00549-9
页码396-400
英文摘要A novel technique, "low energy ion implantation+swift heavy ion irradiation", was used to synthesize light-emitting materials. In the present work, SiO2 films were implanted with 120 keV C+ ions at room temperature (RT) to total doses from 5.0×1016 to 1.0×1018 ions/cm2, and then irradiated at RT with swift Xe or U ions to different irradiation fluences. Photoluminescence (PL) spectra of these samples were measured at RT and intense blue-violet PL bands were observed. The properties of the PL bands were analyzed as a function of implantation ion dose, swift heavy ion irradiation fluence and electronic energy loss of the irradiation ion in the sample. The possible origins of the observed blue and violet emissions were also discussed. © 2002 Elsevier Science B.V. All rights reserved.
会议录Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
会议录出版者Elsevier
源URL[http://119.78.100.186/handle/113462/63965]  
专题中国科学院近代物理研究所
通讯作者Wang, Z.G.
作者单位Institute of Modern Physics, Chinese Academy of Sciences, Nanchang Road, Lanzhou 730000, China
推荐引用方式
GB/T 7714
Wang, Z.G.,Liu, J.,Zhu, Z.Y.,et al. Photoluminescence from C+-implanted SiO2 films after swift heavy ion irradiations[C]. 见:.

入库方式: OAI收割

来源:近代物理研究所

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