中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effects of UV light illumination on track etching in polycarbonate

文献类型:期刊论文

作者Duan, Jinglai; Liu, Jie; Zhu, Zhiyong; Wang, Zhiguang; Sun, Youmei; Hou, Mingdong; Jin, Yunfan; Yao, Huijun; Song, Yin; Zhao, Zhiming
刊名He Jishu/Nuclear Techniques
出版日期2005
卷号28页码:684-687
ISSN号0253-3219
英文摘要Nuclear track membranes offer distinct advantages over conventional membranes due to their precisely determined structure. Their pore size, shape and density can be controlled intentionally so that a membrane with the required characteristics can be produced. The track etching technology plays a most important role in the production of nuclear track membranes. The effects of pretreatment using UV light illumination on track etching of polycarbonate (PC) track membranes were investigated in this work. PC films illuminated by UV light showed a strong enhancement in the track etching rate. Furthermore, the track etching rate had a linear increase with illumination time. The phenomenon is attributed to the oxygen-assisted photo-degradation through generating new photo-unstable species. In this paper, the conductance measurement is also presented, which is a popular method used in etching technology.
出版者Science Press, Beijing, China
源URL[http://119.78.100.186/handle/113462/64225]  
专题中国科学院近代物理研究所
作者单位1.Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China
2.Graduate School, Chinese Academy of Sciences, Beijing 100049, China
3.Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China
推荐引用方式
GB/T 7714
Duan, Jinglai,Liu, Jie,Zhu, Zhiyong,et al. Effects of UV light illumination on track etching in polycarbonate[J]. He Jishu/Nuclear Techniques,2005,28:684-687.
APA Duan, Jinglai.,Liu, Jie.,Zhu, Zhiyong.,Wang, Zhiguang.,Sun, Youmei.,...&Yao, Cunfeng.(2005).Effects of UV light illumination on track etching in polycarbonate.He Jishu/Nuclear Techniques,28,684-687.
MLA Duan, Jinglai,et al."Effects of UV light illumination on track etching in polycarbonate".He Jishu/Nuclear Techniques 28(2005):684-687.

入库方式: OAI收割

来源:近代物理研究所

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