Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by beta-ray
文献类型：期刊论文
| 作者 | Fang, Mei-Hua1; Tian, Peng-Yu1; Zhu, Mao-Dong2; Qi, Hong-Ji2; Fei, Tao1; Lv, Jin-Peng1; Liu, Hui-Ping3
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| 刊名 | CHINESE PHYSICS B
 |
| 出版日期 | 2019-02-01 |
| 卷号 | 28页码:024215 |
| 关键词 | beta-ray irradiation HfO2/SiO2 multilayer film residual stress laser-induced damage threshold |
| ISSN号 | 1674-1056 |
| DOI | 10.1088/1674-1056/28/2/024215 |
| 英文摘要 | Post processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO2/SiO2 multilayer films are prepared by e-beam evaporation and then beta-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold (LIDT), which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm(2) to 12 J/cm(2), i.e., 50% increase, after the film has been irradiated by 2.2x10(13)/cm(2 )beta-ray, the particle irradiation can be used as a controllable and desirable post-processing method to improve the resistance to laser induced damage. |
| WOS关键词 | RESIDUAL-STRESS ; THIN-FILMS ; HFO2 |
| 资助项目 | National Natural Science Foundation of China[11405085] ; Jiangsu Provincial Natural Science Fund, China[BK20130789] |
| WOS研究方向 | Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000458917000015 |
| 出版者 | IOP PUBLISHING LTD |
| 资助机构 | National Natural Science Foundation of China ; Jiangsu Provincial Natural Science Fund, China |
| 源URL | [http://119.78.100.186/handle/113462/64903]  |
| 专题 | 中国科学院近代物理研究所 |
| 作者单位 | 1.Nanjing Univ Aeronaut & Astronaut, Coll Astronaut, Nanjing 210016, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R China 3.Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Peoples R China |
| 推荐引用方式 GB/T 7714 | Fang, Mei-Hua,Tian, Peng-Yu,Zhu, Mao-Dong,et al. Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by beta-ray[J]. CHINESE PHYSICS B,2019,28:024215. |
| APA | Fang, Mei-Hua.,Tian, Peng-Yu.,Zhu, Mao-Dong.,Qi, Hong-Ji.,Fei, Tao.,...&Liu, Hui-Ping.(2019).Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by beta-ray.CHINESE PHYSICS B,28,024215. |
| MLA | Fang, Mei-Hua,et al."Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by beta-ray".CHINESE PHYSICS B 28(2019):024215. |
入库方式： OAI收割
来源：近代物理研究所
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