中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Evolution of defects in silicon carbide implanted with helium ions

文献类型:期刊论文

作者Zhang CH(张崇宏)
刊名Nuclear Instruments and Methods in Physics Research B
出版日期2014-01-15
卷号326期号:326页码:345–350
关键词Silicon carbide Helium Implantation Defect Radiation damage
ISSN号0168-583X
DOI10.1016/j.nimb.2013.10.064
英文摘要Effects of accumulation of radiation damage in silicon carbide are important concerns for the use of silicon carbide in advanced nuclear energy systems. In the present work lattice damage in silicon carbide crystal (4H type) implanted with 100 keV He-4(+) ions was investigated with Rutherford backscattering spectrometry in channeling geometry (RBS/c) and positron beam Doppler broadening spectrometry (PBDB). Helium implantation was performed at the specimen temperature of 510 K to avoid amorphization of the SiC crystal. Fluences of helium ions were selected to be in the range from 1 x 10(16) to 3 x 10(16) ions cm(-2), around the dose threshold for the formation of observable helium bubbles under transmission electron microscopes (TEM).
WOS关键词VACANCY-TYPE DEFECTS ; POSITRON-ANNIHILATION ; DAMAGE ; BEAM ; IRRADIATION ; TEMPERATURE ; ACCUMULATION ; DEPENDENCE ; CERAMICS ; CRYSTALS
资助项目National Magnetic Confinement Fusion Program[2011GB108003]
WOS研究方向Instruments & Instrumentation ; Nuclear Science & Technology ; Physics
语种英语
WOS记录号WOS:000335631300079
出版者ELSEVIER SCIENCE BV
公开日期2014-12-16
源URL[http://ir.impcas.ac.cn/handle/113462/12540]  
专题近代物理研究所_能源材料研究组
近代物理研究所_材料研究中心
推荐引用方式
GB/T 7714
Zhang CH. Evolution of defects in silicon carbide implanted with helium ions[J]. Nuclear Instruments and Methods in Physics Research B,2014,326(326):345–350.
APA Zhang CH.(2014).Evolution of defects in silicon carbide implanted with helium ions.Nuclear Instruments and Methods in Physics Research B,326(326),345–350.
MLA Zhang CH."Evolution of defects in silicon carbide implanted with helium ions".Nuclear Instruments and Methods in Physics Research B 326.326(2014):345–350.

入库方式: OAI收割

来源:近代物理研究所

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