中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Improved Resistive Switching Uniformity in Cu/HfO2/Pt Devices by Using Current Sweeping Mode

文献类型:期刊论文

作者Zhang S(张森); Lian WT(连文泰); Lv HB(吕杭炳); Liu Q(刘琦); Long SB(龙世兵); Wang W(王慰); Wang Y(王艳); Li YT(李颖弢); Liu M(刘明)
刊名IEEEELECTRONDEVICELETTERS
出版日期2011-08-01
公开日期2015-09-23
源URL[http://10.10.10.126/handle/311049/13572]  
专题微电子研究所_微电子器件与集成技术重点实验室
作者单位中国科学院微电子研究所
推荐引用方式
GB/T 7714
Zhang S,Lian WT,Lv HB,et al. Improved Resistive Switching Uniformity in Cu/HfO2/Pt Devices by Using Current Sweeping Mode[J]. IEEEELECTRONDEVICELETTERS,2011.
APA Zhang S.,Lian WT.,Lv HB.,Liu Q.,Long SB.,...&Liu M.(2011).Improved Resistive Switching Uniformity in Cu/HfO2/Pt Devices by Using Current Sweeping Mode.IEEEELECTRONDEVICELETTERS.
MLA Zhang S,et al."Improved Resistive Switching Uniformity in Cu/HfO2/Pt Devices by Using Current Sweeping Mode".IEEEELECTRONDEVICELETTERS (2011).

入库方式: OAI收割

来源:微电子研究所

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