中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effect of Non-Ionic Surfactant on Chemical Mechanical Planarization Performance in Alkaline Copper Slurry

文献类型:期刊论文

作者Chen L(陈岚); Cao H(曹鹤); Xu QZ(徐勤志); Yang F(杨飞)
刊名INTERNATIONAL JOURNAL OF PRECISION ENGINEERING AND MANUFACTURING
出版日期2018-11-13
文献子类期刊论文
源URL[http://159.226.55.107/handle/172511/19039]  
专题微电子研究所_EDA中心
推荐引用方式
GB/T 7714
Chen L,Cao H,Xu QZ,et al. Effect of Non-Ionic Surfactant on Chemical Mechanical Planarization Performance in Alkaline Copper Slurry[J]. INTERNATIONAL JOURNAL OF PRECISION ENGINEERING AND MANUFACTURING,2018.
APA 陈岚,曹鹤,徐勤志,&杨飞.(2018).Effect of Non-Ionic Surfactant on Chemical Mechanical Planarization Performance in Alkaline Copper Slurry.INTERNATIONAL JOURNAL OF PRECISION ENGINEERING AND MANUFACTURING.
MLA 陈岚,et al."Effect of Non-Ionic Surfactant on Chemical Mechanical Planarization Performance in Alkaline Copper Slurry".INTERNATIONAL JOURNAL OF PRECISION ENGINEERING AND MANUFACTURING (2018).

入库方式: OAI收割

来源:微电子研究所

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