中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Evaluation of PMMA Residues as a Function of Baking Temperature and a Graphene Heat-Free-Transfer Process to Reduce Them

文献类型:期刊论文

作者Jia KP(贾昆鹏); Luo J(罗军); Hu RY(胡荣炎); Zhan J(战俊); Cao HS(曹合适); Su YJ(粟雅娟); Zhu HL(朱慧珑); Xie L(谢玲); Zhao C(赵超); Chen DP(陈大鹏)
刊名ECS Journal of Solid state science and tehchnology
出版日期2016
文献子类期刊论文
英文摘要

For the fabrication of high performance graphene devices, the transfer process with clean surface without too many PMMA residues is of paramount importance in that it is has great impact on graphene interface. In this paper, a graphene heat-free-transfer process is proposed for the first time in order to get a decently clean surface. The evaluation of PMMA residues as a function of baking temperature is carried out.

源URL[http://159.226.55.106/handle/172511/16197]  
专题微电子研究所_集成电路先导工艺研发中心
作者单位中国科学院微电子研究所
推荐引用方式
GB/T 7714
Jia KP,Luo J,Hu RY,et al. Evaluation of PMMA Residues as a Function of Baking Temperature and a Graphene Heat-Free-Transfer Process to Reduce Them[J]. ECS Journal of Solid state science and tehchnology,2016.
APA Jia KP.,Luo J.,Hu RY.,Zhan J.,Cao HS.,...&Chen DP.(2016).Evaluation of PMMA Residues as a Function of Baking Temperature and a Graphene Heat-Free-Transfer Process to Reduce Them.ECS Journal of Solid state science and tehchnology.
MLA Jia KP,et al."Evaluation of PMMA Residues as a Function of Baking Temperature and a Graphene Heat-Free-Transfer Process to Reduce Them".ECS Journal of Solid state science and tehchnology (2016).

入库方式: OAI收割

来源:微电子研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。