New alignment mark designs in single patterning and self-aligned double patterning
文献类型：期刊论文
| 作者 | Zhang LB(张利斌) ; Dong LS(董立松); Su XJ(苏晓菁); Wei YY(韦亚一); Ye TC(叶甜春)
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| 刊名 | Microelectronic Engineering
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| 出版日期 | 2017-04-18 |
| 文献子类 | 期刊论文 |
| 源URL | [http://159.226.55.106/handle/172511/18113]  |
| 专题 | 微电子研究所_集成电路先导工艺研发中心 |
| 作者单位 | 中国科学院微电子研究所 |
| 推荐引用方式 GB/T 7714 | Zhang LB,Dong LS,Su XJ,et al. New alignment mark designs in single patterning and self-aligned double patterning[J]. Microelectronic Engineering,2017. |
| APA | Zhang LB,Dong LS,Su XJ,Wei YY,&Ye TC.(2017).New alignment mark designs in single patterning and self-aligned double patterning.Microelectronic Engineering. |
| MLA | Zhang LB,et al."New alignment mark designs in single patterning and self-aligned double patterning".Microelectronic Engineering (2017). |
入库方式： OAI收割
来源：微电子研究所
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