Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes
文献类型：期刊论文
| 作者 | He JF(何建芳) ; Dong LS(董立松); Ye TC(叶甜春); Zhao LJ(赵利俊); Wei YY(韦亚一)
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| 刊名 | APPLIED OPTICS
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| 出版日期 | 2018-09-13 |
| 文献子类 | 期刊论文 |
| 源URL | [http://159.226.55.107/handle/172511/19065]  |
| 专题 | 微电子研究所_集成电路先导工艺研发中心 |
| 作者单位 | 中国科学院微电子研究所 |
| 推荐引用方式 GB/T 7714 | He JF,Dong LS,Ye TC,et al. Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes[J]. APPLIED OPTICS,2018. |
| APA | He JF,Dong LS,Ye TC,Zhao LJ,&Wei YY.(2018).Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes.APPLIED OPTICS. |
| MLA | He JF,et al."Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes".APPLIED OPTICS (2018). |
入库方式： OAI收割
来源：微电子研究所
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