Development defect model for immersion photolithography
文献类型：期刊论文
| 作者 | Qing Wu; Ling Ma; Lisong Dong; Qiaoqiao Li; Yayi Wei; Tianchun Ye |
| 刊名 | J. Micro/Nanolith. MEMS MOEMS
 |
| 出版日期 | 2018-04-23 |
| 文献子类 | 期刊论文 |
| 源URL | [http://159.226.55.107/handle/172511/19066]  |
| 专题 | 微电子研究所_集成电路先导工艺研发中心 |
| 推荐引用方式 GB/T 7714 | Qing Wu,Ling Ma,Lisong Dong,et al. Development defect model for immersion photolithography[J]. J. Micro/Nanolith. MEMS MOEMS,2018. |
| APA | Qing Wu,Ling Ma,Lisong Dong,Qiaoqiao Li,Yayi Wei,&Tianchun Ye.(2018).Development defect model for immersion photolithography.J. Micro/Nanolith. MEMS MOEMS. |
| MLA | Qing Wu,et al."Development defect model for immersion photolithography".J. Micro/Nanolith. MEMS MOEMS (2018). |
入库方式： OAI收割
来源：微电子研究所
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