Influence of the hard masks profiles on formation of nanometer Si scalloped fins arrays
文献类型：期刊论文
| 作者 | Tongda Ma; Zhang QZ(张青竹); Hailing Tu; Yin HX(殷华湘); Feng Wei; Li JJ(李俊杰); Meng LK(孟令款); Zhang ZH(张兆浩); Yan J(闫江); Hongbin Zhao |
| 刊名 | MICROELECTRONIC ENGINEERING
 |
| 出版日期 | 2018-07-18 |
| 文献子类 | 期刊论文 |
| 源URL | [http://159.226.55.107/handle/172511/19194]  |
| 专题 | 微电子研究所_集成电路先导工艺研发中心 |
| 推荐引用方式 GB/T 7714 | Tongda Ma,Zhang QZ,Hailing Tu,et al. Influence of the hard masks profiles on formation of nanometer Si scalloped fins arrays[J]. MICROELECTRONIC ENGINEERING,2018. |
| APA | Tongda Ma.,张青竹.,Hailing Tu.,殷华湘.,Feng Wei.,...&YanYan Fan.(2018).Influence of the hard masks profiles on formation of nanometer Si scalloped fins arrays.MICROELECTRONIC ENGINEERING. |
| MLA | Tongda Ma,et al."Influence of the hard masks profiles on formation of nanometer Si scalloped fins arrays".MICROELECTRONIC ENGINEERING (2018). |
入库方式： OAI收割
来源：微电子研究所
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