a-SiCx : H films deposited by plasma-enhanced chemical vapor deposition at low temperature used for moisture and corrosion resistant applications
文献类型：期刊论文
| 作者 | Jiang, LJ ; Chen, X ; Wang, XH ; Xu, LQ ; Stubhan, F ; Merkel, KH |
| 刊名 | THIN SOLID FILMS
 |
| 出版日期 | 1999-01-01 |
| 卷号 | 352期号:1-2页码:97-101 |
| 关键词 | SILICON CARBIDE FILMS FREQUENCY LAYERS ALLOY PECVD |
| ISSN号 | 0040-6090 |
| 通讯作者 | Xu, LQ, Acad Sinica, Shanghai Inst Met, SIM DaimlerChrysler Lab, Shanghai 200050, Peoples R China |
| 学科主题 | Materials Science, Multidisciplinary; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2011-11-09 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/17483]  |
| 专题 | 上海微系统与信息技术研究所_化学研究_期刊论文 |
| 推荐引用方式 GB/T 7714 | Jiang, LJ,Chen, X,Wang, XH,et al. a-SiCx : H films deposited by plasma-enhanced chemical vapor deposition at low temperature used for moisture and corrosion resistant applications[J]. THIN SOLID FILMS,1999,352(1-2):97-101. |
| APA | Jiang, LJ,Chen, X,Wang, XH,Xu, LQ,Stubhan, F,&Merkel, KH.(1999).a-SiCx : H films deposited by plasma-enhanced chemical vapor deposition at low temperature used for moisture and corrosion resistant applications.THIN SOLID FILMS,352(1-2),97-101. |
| MLA | Jiang, LJ,et al."a-SiCx : H films deposited by plasma-enhanced chemical vapor deposition at low temperature used for moisture and corrosion resistant applications".THIN SOLID FILMS 352.1-2(1999):97-101. |
入库方式： OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。