中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Evaluating AlGaN/AlN/GaN heterostructure Schottky barrier heights with flat-band voltage from forward current-voltage characteristics

文献类型:期刊论文

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作者Lv YJ; Lin ZJ; Meng LG; Yu YX; Luan CB; Cao ZF; Chen H; Sun BQ; Wang ZG; Lin, ZJ (reprint author), Shandong Univ, Sch Phys, Jinan 250100, Peoples R China, linzj@sdu.edu.cn
刊名applied physics letters ; APPLIED PHYSICS LETTERS
出版日期2011 ; 2011
卷号99期号:12页码:123504
ISSN号0003-6951 ; 0003-6951
通讯作者lin, zj (reprint author), shandong univ, sch phys, jinan 250100, peoples r china, linzj@sdu.edu.cn
英文摘要Both circular and rectangular Ni Schottky contacts on AlGaN/AlN/GaN heterostructures have been fabricated. Both of the Schottky barrier heights were measured by internal photoemission. The flat-band voltage (V(0)) for the AlGaN/AlN/GaN heterostructure Schottky contacts was analyzed and obtained from the forward current-voltage (I-V) characteristics. Based on the forward I-V characteristics and with the obtained flat-band voltage, the Schottky barrier heights for the circular and rectangular diodes have been analyzed and calculated by self-consistently solving Schrodinger's and Poisson's equations. The evaluated Schottky barrier heights for the prepared circular and rectangular Ni Schottky diodes agree well with the photocurrent measured results. (C) 2011 American Institute of Physics. [doi:10.1063/1.3643139]
学科主题半导体物理 ; 半导体物理
收录类别SCI
资助信息national natural science foundation of china[10774090]; national basic research program of china[2007cb936602]
语种英语 ; 英语
资助机构National Natural Science Foundation of China[10774090]; National Basic Research Program of China[2007CB936602]
公开日期2012-01-06 ; 2012-01-06
源URL[http://ir.semi.ac.cn/handle/172111/22683]  
专题半导体研究所_半导体超晶格国家重点实验室
通讯作者Lin, ZJ (reprint author), Shandong Univ, Sch Phys, Jinan 250100, Peoples R China, linzj@sdu.edu.cn
推荐引用方式
GB/T 7714
Lv YJ,Lin ZJ,Meng LG,et al. Evaluating AlGaN/AlN/GaN heterostructure Schottky barrier heights with flat-band voltage from forward current-voltage characteristics, Evaluating AlGaN/AlN/GaN heterostructure Schottky barrier heights with flat-band voltage from forward current-voltage characteristics[J]. applied physics letters, APPLIED PHYSICS LETTERS,2011, 2011,99, 99(12):123504, 123504.
APA Lv YJ.,Lin ZJ.,Meng LG.,Yu YX.,Luan CB.,...&Lin, ZJ .(2011).Evaluating AlGaN/AlN/GaN heterostructure Schottky barrier heights with flat-band voltage from forward current-voltage characteristics.applied physics letters,99(12),123504.
MLA Lv YJ,et al."Evaluating AlGaN/AlN/GaN heterostructure Schottky barrier heights with flat-band voltage from forward current-voltage characteristics".applied physics letters 99.12(2011):123504.

入库方式: OAI收割

来源:半导体研究所

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