中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
GaAs-based long-wavelength InAs quantum dots on multi-step-graded InGaAs metamorphic buffer grown by molecular beam epitaxy

文献类型:期刊论文

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作者He JF; Wang HL; Shang XJ; Li MF; Zhu Y; Wang LJ; Yu Y; Ni HQ; Xu YQ; Niu ZC
刊名journal of physics d-applied physics ; JOURNAL OF PHYSICS D-APPLIED PHYSICS
出版日期2011 ; 2011
卷号44期号:33页码:335102
ISSN号0022-3727 ; 0022-3727
关键词1.3 MU-M STRAIN RELIEF LASERS SUBSTRATE PHOTOLUMINESCENCE DISLOCATIONS OPERATION RANGE 1.3 Mu-m Strain Relief Lasers Substrate Photoluminescence Dislocations Operation Range
通讯作者he, jf (reprint author), chinese acad sci, inst semicond, state key lab superlattices & microstruct, pob 912, beijing 100083, peoples r china, hejifang@semi.ac.cn
英文摘要Molecular beam epitaxy growth of GaAs-based long-wavelength metamorphic InAs/InGaAs quantum dots (QDs) is investigated. With optimized multi-step-graded InGaAs metamorphic buffer layers and growth conditions, room temperature 1.46 mu m emission from InAs/In(0.15)Ga(0.85)As QDs is realized, and broad-area laser diodes are fabricated with a very low etch pit defect density of less than 5.0 x 10(3) cm(-2). The lasers operate under pulsed operation mode at room temperature with a low threshold current density of 146.7A cm(-2).
学科主题半导体物理 ; 半导体物理
资助信息national natural science foundation of china[10734060, 90921015]; national basic research program of china[2007cb936304, 2010cb327601]
收录类别SCI
语种英语 ; 英语
资助机构National Natural Science Foundation of China[10734060, 90921015]; National Basic Research Program of China[2007CB936304, 2010CB327601]
公开日期2012-01-06 ; 2012-01-06
源URL[http://ir.semi.ac.cn/handle/172111/22685]  
专题半导体研究所_半导体超晶格国家重点实验室
通讯作者He, JF (reprint author), Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, POB 912, Beijing 100083, Peoples R China, hejifang@semi.ac.cn
推荐引用方式
GB/T 7714
He JF,Wang HL,Shang XJ,et al. GaAs-based long-wavelength InAs quantum dots on multi-step-graded InGaAs metamorphic buffer grown by molecular beam epitaxy, GaAs-based long-wavelength InAs quantum dots on multi-step-graded InGaAs metamorphic buffer grown by molecular beam epitaxy[J]. journal of physics d-applied physics, JOURNAL OF PHYSICS D-APPLIED PHYSICS,2011, 2011,44, 44(33):335102, 335102.
APA He JF.,Wang HL.,Shang XJ.,Li MF.,Zhu Y.,...&He, JF .(2011).GaAs-based long-wavelength InAs quantum dots on multi-step-graded InGaAs metamorphic buffer grown by molecular beam epitaxy.journal of physics d-applied physics,44(33),335102.
MLA He JF,et al."GaAs-based long-wavelength InAs quantum dots on multi-step-graded InGaAs metamorphic buffer grown by molecular beam epitaxy".journal of physics d-applied physics 44.33(2011):335102.

入库方式: OAI收割

来源:半导体研究所

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