中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Strained and strain-relaxed epitaxial Ge(1-x)Sn(x) alloys on Si(100) substrates

文献类型:期刊论文

作者Wang, W ; Su, SJ ; Zheng, J ; Zhang, GZ ; Zuo, YH ; Cheng, BW ; Wang, QM
刊名chinese physics b
出版日期2011
卷号20期号:6页码:68103
ISSN号1009-1963
关键词GeSn alloys strained strain-relaxed molecular beam epitaxy
通讯作者cheng, bw (reprint author), chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china,cbw@semi.ac.cn
学科主题光电子学
资助信息national high technology research and development program of china[2006aa03z415]; national basic research program of china[2007cb613404]; national natural science foundation of china[60906035, 61036003]; chinese academy of sciences[iscas2009t01]
收录类别SCI
语种英语
公开日期2012-02-06
源URL[http://ir.semi.ac.cn/handle/172111/22867]  
专题半导体研究所_集成光电子学国家重点实验室
推荐引用方式
GB/T 7714
Wang, W,Su, SJ,Zheng, J,et al. Strained and strain-relaxed epitaxial Ge(1-x)Sn(x) alloys on Si(100) substrates[J]. chinese physics b,2011,20(6):68103.
APA Wang, W.,Su, SJ.,Zheng, J.,Zhang, GZ.,Zuo, YH.,...&Wang, QM.(2011).Strained and strain-relaxed epitaxial Ge(1-x)Sn(x) alloys on Si(100) substrates.chinese physics b,20(6),68103.
MLA Wang, W,et al."Strained and strain-relaxed epitaxial Ge(1-x)Sn(x) alloys on Si(100) substrates".chinese physics b 20.6(2011):68103.

入库方式: OAI收割

来源:半导体研究所

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