Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition
文献类型:期刊论文
作者 | Shi K (Shi K.) ; Zhang PF (Zhang P. F.) ; Wei HY (Wei H. Y.) ; Jiao CM (Jiao C. M.) ; Jin P (Jin P.) ; Liu XL (Liu X. L.) ; Yang SY (Yang S. Y.) ; Zhu QS (Zhu Q. S.) ; Wang ZG (Wang Z. G.) |
刊名 | journal of applied physics |
出版日期 | 2011 |
卷号 | 110期号:11页码:113509 |
学科主题 | 半导体材料 |
公开日期 | 2012-02-22 |
源URL | [http://ir.semi.ac.cn/handle/172111/22932] |
专题 | 半导体研究所_中科院半导体材料科学重点实验室 |
推荐引用方式 GB/T 7714 | Shi K ,Zhang PF ,Wei HY ,et al. Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition[J]. journal of applied physics,2011,110(11):113509. |
APA | Shi K .,Zhang PF .,Wei HY .,Jiao CM .,Jin P .,...&Wang ZG .(2011).Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition.journal of applied physics,110(11),113509. |
MLA | Shi K ,et al."Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition".journal of applied physics 110.11(2011):113509. |
入库方式: OAI收割
来源:半导体研究所
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