Millimeter-scale self-collimation in planar photonic crystals fabricated by CMOS technology
文献类型：期刊论文
| 作者 | Yang,ZF ; Wu,AM ; Fang,N ; Lin,XL ; Jiang,XY ; Zou,SC ; Wang,X |
| 刊名 | OPTICS COMMUNICATIONS
 |
| 出版日期 | 2010 |
| 卷号 | 283期号:4页码:604-607 |
| 关键词 | LITHOGRAPHY |
| ISSN号 | 0030-4018 |
| 通讯作者 | Yang, ZF, Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China |
| 学科主题 | Optics |
| 收录类别 | SCI |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/94641]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Yang,ZF,Wu,AM,Fang,N,et al. Millimeter-scale self-collimation in planar photonic crystals fabricated by CMOS technology[J]. OPTICS COMMUNICATIONS,2010,283(4):604-607. |
| APA | Yang,ZF.,Wu,AM.,Fang,N.,Lin,XL.,Jiang,XY.,...&Wang,X.(2010).Millimeter-scale self-collimation in planar photonic crystals fabricated by CMOS technology.OPTICS COMMUNICATIONS,283(4),604-607. |
| MLA | Yang,ZF,et al."Millimeter-scale self-collimation in planar photonic crystals fabricated by CMOS technology".OPTICS COMMUNICATIONS 283.4(2010):604-607. |
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