中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate

文献类型:期刊论文

作者Zhang, ZF ; Liu, WL ; Song, ZT
刊名MICROELECTRONIC ENGINEERING
出版日期2010
卷号87期号:11页码:2168-2172
关键词PLANARIZATION PH
ISSN号0167-9317
通讯作者Liu, WL, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Lab Nanotechnol, State Key Lab Funct Mat Informat, 865 Changning Rd, Shanghai 200050, Peoples R China
学科主题Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Optics; Physics, Applied
收录类别SCI
语种英语
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/94670]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Zhang, ZF,Liu, WL,Song, ZT. Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate[J]. MICROELECTRONIC ENGINEERING,2010,87(11):2168-2172.
APA Zhang, ZF,Liu, WL,&Song, ZT.(2010).Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate.MICROELECTRONIC ENGINEERING,87(11),2168-2172.
MLA Zhang, ZF,et al."Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate".MICROELECTRONIC ENGINEERING 87.11(2010):2168-2172.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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