Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate
文献类型：期刊论文
| 作者 | Zhang, ZF ; Liu, WL ; Song, ZT |
| 刊名 | MICROELECTRONIC ENGINEERING
 |
| 出版日期 | 2010 |
| 卷号 | 87期号:11页码:2168-2172 |
| 关键词 | PLANARIZATION PH |
| ISSN号 | 0167-9317 |
| 通讯作者 | Liu, WL, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Lab Nanotechnol, State Key Lab Funct Mat Informat, 865 Changning Rd, Shanghai 200050, Peoples R China |
| 学科主题 | Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Optics; Physics, Applied |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/94670]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Zhang, ZF,Liu, WL,Song, ZT. Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate[J]. MICROELECTRONIC ENGINEERING,2010,87(11):2168-2172. |
| APA | Zhang, ZF,Liu, WL,&Song, ZT.(2010).Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate.MICROELECTRONIC ENGINEERING,87(11),2168-2172. |
| MLA | Zhang, ZF,et al."Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate".MICROELECTRONIC ENGINEERING 87.11(2010):2168-2172. |
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