Carrier Profiling of Individual Si Nanowires by Scanning Spreading Resistance Microscopy
文献类型:期刊论文
作者 | Ou, X ; Das Kanungo, P ; Kogler, R ; Werner, P ; Gosele, U ; Skorupa, W ; Wang, X |
刊名 | NANO LETTERS
![]() |
出版日期 | 2010 |
卷号 | 10期号:1页码:171-175 |
关键词 | SILICON NANOWIRES PILE-UP PHOSPHORUS IMPURITIES INTERFACE TRANSPORT GERMANIUM DENSITY |
ISSN号 | 1530-6984 |
通讯作者 | Ou, X, Max Planck Inst Microstruct Phys, Weinberg 2, D-06120 Halle, Germany |
学科主题 | Chemistry, Multidisciplinary; Chemistry, Physical; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2012-03-24 |
源URL | [http://ir.sim.ac.cn/handle/331004/94739] ![]() |
专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
推荐引用方式 GB/T 7714 | Ou, X,Das Kanungo, P,Kogler, R,et al. Carrier Profiling of Individual Si Nanowires by Scanning Spreading Resistance Microscopy[J]. NANO LETTERS,2010,10(1):171-175. |
APA | Ou, X.,Das Kanungo, P.,Kogler, R.,Werner, P.,Gosele, U.,...&Wang, X.(2010).Carrier Profiling of Individual Si Nanowires by Scanning Spreading Resistance Microscopy.NANO LETTERS,10(1),171-175. |
MLA | Ou, X,et al."Carrier Profiling of Individual Si Nanowires by Scanning Spreading Resistance Microscopy".NANO LETTERS 10.1(2010):171-175. |
入库方式: OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。