Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry
文献类型：期刊论文
| 作者 | Zhang, ZF ; Liu, WL ; Song, ZT |
| 刊名 | APPLIED OPTICS
 |
| 出版日期 | 2010 |
| 卷号 | 49期号:28页码:5480-5485 |
| 关键词 | SUBSTRATE CMP DIOXIDE PLANARIZATION SAPPHIRE CERIA ACID |
| ISSN号 | 0003-6935 |
| 通讯作者 | Zhang, ZF, Chinese Acad Sci, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China |
| 学科主题 | Optics |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2012-03-24 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/94747]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Zhang, ZF,Liu, WL,Song, ZT. Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry[J]. APPLIED OPTICS,2010,49(28):5480-5485. |
| APA | Zhang, ZF,Liu, WL,&Song, ZT.(2010).Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry.APPLIED OPTICS,49(28),5480-5485. |
| MLA | Zhang, ZF,et al."Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry".APPLIED OPTICS 49.28(2010):5480-5485. |
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