中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Study on Adhesive Strength between Ge2Sb2Te5 Film and Electrodes for Phase Change Memory Application

文献类型:期刊论文

作者Liu, YB ; Zhang, T ; Zhang, GX ; Niu, XM ; Song, ZT ; Min, GQ ; Lin, Y ; Zhang, J ; Zhou, WM ; Zhang, JP ; Chu, JT ; Wan, YZ ; Feng, SL
刊名JAPANESE JOURNAL OF APPLIED PHYSICS
出版日期2009
卷号48期号:10页码:101601-101601
关键词THIN-FILMS CRYSTALLIZATION RESISTANCE
ISSN号0021-4922
通讯作者Liu, YB, Shanghai Nanotechnol Promot Ctr, Lab Nanotechnol, Shanghai 200237, Peoples R China
学科主题Physics, Applied
收录类别SCI
语种英语
公开日期2012-03-24
源URL[http://ir.sim.ac.cn/handle/331004/94886]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Liu, YB,Zhang, T,Zhang, GX,et al. Study on Adhesive Strength between Ge2Sb2Te5 Film and Electrodes for Phase Change Memory Application[J]. JAPANESE JOURNAL OF APPLIED PHYSICS,2009,48(10):101601-101601.
APA Liu, YB.,Zhang, T.,Zhang, GX.,Niu, XM.,Song, ZT.,...&Feng, SL.(2009).Study on Adhesive Strength between Ge2Sb2Te5 Film and Electrodes for Phase Change Memory Application.JAPANESE JOURNAL OF APPLIED PHYSICS,48(10),101601-101601.
MLA Liu, YB,et al."Study on Adhesive Strength between Ge2Sb2Te5 Film and Electrodes for Phase Change Memory Application".JAPANESE JOURNAL OF APPLIED PHYSICS 48.10(2009):101601-101601.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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