中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
PULSED, Q-SWITCHED RUBY-LASER ANNEALING OF BI IMPLANTED SI CRYSTALS INVESTIGATED BY CHANNELING

文献类型:期刊论文

作者DEUTCH, BI ; TSOU, SC ; LEOU, SH ; ZHOU, ZY ; ZENG, HJ ; DAI, RZ ; CHU, TC ; CAO, DX
刊名RADIATION EFFECTS AND DEFECTS IN SOLIDS
出版日期1979
卷号45期号:1-2页码:103-109
ISSN号1042-0150
通讯作者DEUTCH, BI, AARHUS UNIV,INST PHYS,DK-8000 AARHUS C,DENMARK
学科主题Nuclear Science & Technology; Physics, Condensed Matter
收录类别SCI
原文出处http://www.tandfonline.com/doi/abs/10.1080/00337577908208415
语种英语
公开日期2012-03-25
源URL[http://ir.sim.ac.cn/handle/331004/97988]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文(1999年以前)
推荐引用方式
GB/T 7714
DEUTCH, BI,TSOU, SC,LEOU, SH,et al. PULSED, Q-SWITCHED RUBY-LASER ANNEALING OF BI IMPLANTED SI CRYSTALS INVESTIGATED BY CHANNELING[J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS,1979,45(1-2):103-109.
APA DEUTCH, BI.,TSOU, SC.,LEOU, SH.,ZHOU, ZY.,ZENG, HJ.,...&CAO, DX.(1979).PULSED, Q-SWITCHED RUBY-LASER ANNEALING OF BI IMPLANTED SI CRYSTALS INVESTIGATED BY CHANNELING.RADIATION EFFECTS AND DEFECTS IN SOLIDS,45(1-2),103-109.
MLA DEUTCH, BI,et al."PULSED, Q-SWITCHED RUBY-LASER ANNEALING OF BI IMPLANTED SI CRYSTALS INVESTIGATED BY CHANNELING".RADIATION EFFECTS AND DEFECTS IN SOLIDS 45.1-2(1979):103-109.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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