中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
PHOTOBEHAVIOR OF PARAMAGNETIC ANION ANTISITES IN PLASTICALLY DEFORMED GAAS

文献类型:期刊论文

作者BENCHIGUER, T ; MARI, B ; SCHWAB, C ; WU, J ; WANG, GY
刊名JOURNAL OF APPLIED PHYSICS
出版日期1992
卷号72期号:4页码:1323-1326
关键词SEMI-INSULATING GAAS EPITAXIAL GAAS DEFECTS DEFORMATION DISLOCATIONS CRYSTALS BULK EL2
ISSN号0021-8979
通讯作者BENCHIGUER, T, UNIV LOUIS PASTEUR,CTR RECH NUCL,IN2P3,CNRS,RECH PHYS & MAT GRP,BP 20,F-67037 STRASBOURG 2,FRANCE
学科主题Physics, Applied
收录类别SCI
语种英语
公开日期2012-03-25
源URL[http://ir.sim.ac.cn/handle/331004/98396]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文(1999年以前)
推荐引用方式
GB/T 7714
BENCHIGUER, T,MARI, B,SCHWAB, C,et al. PHOTOBEHAVIOR OF PARAMAGNETIC ANION ANTISITES IN PLASTICALLY DEFORMED GAAS[J]. JOURNAL OF APPLIED PHYSICS,1992,72(4):1323-1326.
APA BENCHIGUER, T,MARI, B,SCHWAB, C,WU, J,&WANG, GY.(1992).PHOTOBEHAVIOR OF PARAMAGNETIC ANION ANTISITES IN PLASTICALLY DEFORMED GAAS.JOURNAL OF APPLIED PHYSICS,72(4),1323-1326.
MLA BENCHIGUER, T,et al."PHOTOBEHAVIOR OF PARAMAGNETIC ANION ANTISITES IN PLASTICALLY DEFORMED GAAS".JOURNAL OF APPLIED PHYSICS 72.4(1992):1323-1326.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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