Atomic force microscopy study on topography of films produced by ion-based techniques
文献类型：期刊论文
| 作者 | Wang,X ; Liu,XH ; Zou,SC ; Martin,PJ ; Bendavid,A |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 出版日期 | 1996 |
| 卷号 | 80期号:5页码:2658-2664 |
| 关键词 | FILTERED ARC EVAPORATION DEPOSITION VACUUM |
| ISSN号 | 0021-8979 |
| 通讯作者 | Wang, X, ACAD SINICA,SHANGHAI INST MET,ION BEAM LAB,SHANGHAI 200050,PEOPLES R CHINA |
| 学科主题 | Physics ; Applied |
| 收录类别 | SCI |
| 公开日期 | 2012-03-25 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/98670]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文（1999年以前) |
| 推荐引用方式 GB/T 7714 | Wang,X,Liu,XH,Zou,SC,et al. Atomic force microscopy study on topography of films produced by ion-based techniques[J]. JOURNAL OF APPLIED PHYSICS,1996,80(5):2658-2664. |
| APA | Wang,X,Liu,XH,Zou,SC,Martin,PJ,&Bendavid,A.(1996).Atomic force microscopy study on topography of films produced by ion-based techniques.JOURNAL OF APPLIED PHYSICS,80(5),2658-2664. |
| MLA | Wang,X,et al."Atomic force microscopy study on topography of films produced by ion-based techniques".JOURNAL OF APPLIED PHYSICS 80.5(1996):2658-2664. |
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