中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The modification of SIMOX (separated by implantation of oxygen) material to improve the total-dose irradiation hardness

文献类型:期刊论文

作者Gao, JX ; Yu, XF ; Zhang, M ; Lin, CL ; Yan, RL ; Ren, DY
刊名JOURNAL OF PHYSICS-CONDENSED MATTER
出版日期1998
卷号10期号:20页码:4393-4399
ISSN号0953-8984
关键词BURIED OXIDES SOI SILICON WAFERS
通讯作者Gao, JX, Acad Sinica, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
学科主题Physics, Condensed Matter
收录类别SCI
语种英语
公开日期2012-03-25
源URL[http://ir.sim.ac.cn/handle/331004/98924]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文(1999年以前)
推荐引用方式
GB/T 7714
Gao, JX,Yu, XF,Zhang, M,et al. The modification of SIMOX (separated by implantation of oxygen) material to improve the total-dose irradiation hardness[J]. JOURNAL OF PHYSICS-CONDENSED MATTER,1998,10(20):4393-4399.
APA Gao, JX,Yu, XF,Zhang, M,Lin, CL,Yan, RL,&Ren, DY.(1998).The modification of SIMOX (separated by implantation of oxygen) material to improve the total-dose irradiation hardness.JOURNAL OF PHYSICS-CONDENSED MATTER,10(20),4393-4399.
MLA Gao, JX,et al."The modification of SIMOX (separated by implantation of oxygen) material to improve the total-dose irradiation hardness".JOURNAL OF PHYSICS-CONDENSED MATTER 10.20(1998):4393-4399.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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